Development of Photolithography Process for Printed Circuit Board Using Liquid Crystal Mask in Place of Photomask

Development of Photolithography Process for Printed Circuit Board Using Liquid Crystal Mask in Place of Photomask

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Veröffentlicht in:Japanese Journal of Applied Physics 2012-09, Vol.51 (9S2), p.9
Hauptverfasser: Oh, Min Sup, Lee, Jae Hong, Hong, Chinsoo, Lee, Ho-Nyeon, Kim, Chang Kyo
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Sprache:eng ; jpn
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container_end_page
container_issue 9S2
container_start_page 9
container_title Japanese Journal of Applied Physics
container_volume 51
creator Oh, Min Sup
Lee, Jae Hong
Hong, Chinsoo
Lee, Ho-Nyeon
Kim, Chang Kyo
description
doi_str_mv 10.7567/JJAP.51.09MF16
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_7567_JJAP_51_09MF16</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_7567_JJAP_51_09MF16</sourcerecordid><originalsourceid>FETCH-LOGICAL-c1050-e65181bf30d7691fb0899c02a6569e0ba95b0f88521daf13710445890f0e34a73</originalsourceid><addsrcrecordid>eNo9kE9PwjAYxhujiYhePfcLbL7v1nbrEVFQAnEHOS_d1kJ1rNAOE769IxhPz7_kOfwIeUSIMy6yp8ViUsQcY5CrGYorMsKUZREDwa_JCCDBiMkkuSV3IXwNUXCGI3J40T-6dfud7nrqDC22rnet7bdu49V-e6KFd7UOgRrnB2-7Xjd0an19tD19dso3dB1st6FLezjaYfKn0KuWrlT4prajRatq_X-8G9p7cmNUG_TDn47Jevb6OX2Llh_z9-lkGdUIHCItOOZYmRSaTEg0FeRS1pAowYXUUCnJKzB5zhNslME0Q2CM5xIM6JSpLB2T-PJbexeC16bce7tT_lQilGdg5RlYybG8AEt_AS-VXuk</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Development of Photolithography Process for Printed Circuit Board Using Liquid Crystal Mask in Place of Photomask</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Oh, Min Sup ; Lee, Jae Hong ; Hong, Chinsoo ; Lee, Ho-Nyeon ; Kim, Chang Kyo</creator><creatorcontrib>Oh, Min Sup ; Lee, Jae Hong ; Hong, Chinsoo ; Lee, Ho-Nyeon ; Kim, Chang Kyo</creatorcontrib><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.7567/JJAP.51.09MF16</identifier><language>eng ; jpn</language><ispartof>Japanese Journal of Applied Physics, 2012-09, Vol.51 (9S2), p.9</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c1050-e65181bf30d7691fb0899c02a6569e0ba95b0f88521daf13710445890f0e34a73</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Oh, Min Sup</creatorcontrib><creatorcontrib>Lee, Jae Hong</creatorcontrib><creatorcontrib>Hong, Chinsoo</creatorcontrib><creatorcontrib>Lee, Ho-Nyeon</creatorcontrib><creatorcontrib>Kim, Chang Kyo</creatorcontrib><title>Development of Photolithography Process for Printed Circuit Board Using Liquid Crystal Mask in Place of Photomask</title><title>Japanese Journal of Applied Physics</title><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNo9kE9PwjAYxhujiYhePfcLbL7v1nbrEVFQAnEHOS_d1kJ1rNAOE769IxhPz7_kOfwIeUSIMy6yp8ViUsQcY5CrGYorMsKUZREDwa_JCCDBiMkkuSV3IXwNUXCGI3J40T-6dfud7nrqDC22rnet7bdu49V-e6KFd7UOgRrnB2-7Xjd0an19tD19dso3dB1st6FLezjaYfKn0KuWrlT4prajRatq_X-8G9p7cmNUG_TDn47Jevb6OX2Llh_z9-lkGdUIHCItOOZYmRSaTEg0FeRS1pAowYXUUCnJKzB5zhNslME0Q2CM5xIM6JSpLB2T-PJbexeC16bce7tT_lQilGdg5RlYybG8AEt_AS-VXuk</recordid><startdate>20120901</startdate><enddate>20120901</enddate><creator>Oh, Min Sup</creator><creator>Lee, Jae Hong</creator><creator>Hong, Chinsoo</creator><creator>Lee, Ho-Nyeon</creator><creator>Kim, Chang Kyo</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20120901</creationdate><title>Development of Photolithography Process for Printed Circuit Board Using Liquid Crystal Mask in Place of Photomask</title><author>Oh, Min Sup ; Lee, Jae Hong ; Hong, Chinsoo ; Lee, Ho-Nyeon ; Kim, Chang Kyo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c1050-e65181bf30d7691fb0899c02a6569e0ba95b0f88521daf13710445890f0e34a73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng ; jpn</language><creationdate>2012</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Oh, Min Sup</creatorcontrib><creatorcontrib>Lee, Jae Hong</creatorcontrib><creatorcontrib>Hong, Chinsoo</creatorcontrib><creatorcontrib>Lee, Ho-Nyeon</creatorcontrib><creatorcontrib>Kim, Chang Kyo</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Oh, Min Sup</au><au>Lee, Jae Hong</au><au>Hong, Chinsoo</au><au>Lee, Ho-Nyeon</au><au>Kim, Chang Kyo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Development of Photolithography Process for Printed Circuit Board Using Liquid Crystal Mask in Place of Photomask</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2012-09-01</date><risdate>2012</risdate><volume>51</volume><issue>9S2</issue><spage>9</spage><pages>9-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><doi>10.7567/JJAP.51.09MF16</doi></addata></record>
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1347-4065
language eng ; jpn
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title Development of Photolithography Process for Printed Circuit Board Using Liquid Crystal Mask in Place of Photomask
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-19T11%3A14%3A08IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Development%20of%20Photolithography%20Process%20for%20Printed%20Circuit%20Board%20Using%20Liquid%20Crystal%20Mask%20in%20Place%20of%20Photomask&rft.jtitle=Japanese%20Journal%20of%20Applied%20Physics&rft.au=Oh,%20Min%20Sup&rft.date=2012-09-01&rft.volume=51&rft.issue=9S2&rft.spage=9&rft.pages=9-&rft.issn=0021-4922&rft.eissn=1347-4065&rft_id=info:doi/10.7567/JJAP.51.09MF16&rft_dat=%3Ccrossref%3E10_7567_JJAP_51_09MF16%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true