Tungsten Film Chemical Mechanical Polishing Using MnO 2 Slurry

Tungsten Film Chemical Mechanical Polishing Using MnO 2 Slurry

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Veröffentlicht in:Japanese Journal of Applied Physics 2011-07, Vol.50 (7R), p.76502
Hauptverfasser: Kishii, Sadahiro, Hatada, Akiyoshi, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K.
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container_end_page
container_issue 7R
container_start_page 76502
container_title Japanese Journal of Applied Physics
container_volume 50
creator Kishii, Sadahiro
Hatada, Akiyoshi
Arimoto, Yoshihiro
Kurokawa, Syuhei
Doi, Toshiro K.
description
doi_str_mv 10.7567/JJAP.50.076502
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_7567_JJAP_50_076502</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>n/a</sourcerecordid><originalsourceid>FETCH-LOGICAL-c842-bedd3dd3b5a6b16a95021afb50e30fb0673d0cbecc5630bae812d389d50f7f333</originalsourceid><addsrcrecordid>eNp1j0FLwzAUx4MoOKdXz_0CrS9Nk3YXYRSnjo0NrOeQpMkaaVNJusO-va3zIILw-L__5fd4P4TuMSQ5ZfnDer3cJxQSyBmF9ALNMMnyOANGL3_1a3QTwgdAymiGZ-ixOrpDGLSLVrbtorLRnVWijbZaNcJ9133f2tBYd4jew5Rbt4vS6K09en-6RVdGtEHf_ew5qlZPVfkSb3bPr-VyE6siS2Op65qMI6lgEjOxGP_DwkgKmoCRwHJSg5JaKcoISKELnNakWNQUTG4IIXOUnM8q34fgteGf3nbCnzgGPsnzSZ5T4Gf5Ecj-AMoOYrC9G7yw7X_YF_yEXaA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Tungsten Film Chemical Mechanical Polishing Using MnO 2 Slurry</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Kishii, Sadahiro ; Hatada, Akiyoshi ; Arimoto, Yoshihiro ; Kurokawa, Syuhei ; Doi, Toshiro K.</creator><creatorcontrib>Kishii, Sadahiro ; Hatada, Akiyoshi ; Arimoto, Yoshihiro ; Kurokawa, Syuhei ; Doi, Toshiro K.</creatorcontrib><identifier>ISSN: 1347-4065</identifier><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.7567/JJAP.50.076502</identifier><language>eng</language><ispartof>Japanese Journal of Applied Physics, 2011-07, Vol.50 (7R), p.76502</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c842-bedd3dd3b5a6b16a95021afb50e30fb0673d0cbecc5630bae812d389d50f7f333</citedby><cites>FETCH-LOGICAL-c842-bedd3dd3b5a6b16a95021afb50e30fb0673d0cbecc5630bae812d389d50f7f333</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>Kishii, Sadahiro</creatorcontrib><creatorcontrib>Hatada, Akiyoshi</creatorcontrib><creatorcontrib>Arimoto, Yoshihiro</creatorcontrib><creatorcontrib>Kurokawa, Syuhei</creatorcontrib><creatorcontrib>Doi, Toshiro K.</creatorcontrib><title>Tungsten Film Chemical Mechanical Polishing Using MnO 2 Slurry</title><title>Japanese Journal of Applied Physics</title><issn>1347-4065</issn><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNp1j0FLwzAUx4MoOKdXz_0CrS9Nk3YXYRSnjo0NrOeQpMkaaVNJusO-va3zIILw-L__5fd4P4TuMSQ5ZfnDer3cJxQSyBmF9ALNMMnyOANGL3_1a3QTwgdAymiGZ-ixOrpDGLSLVrbtorLRnVWijbZaNcJ9133f2tBYd4jew5Rbt4vS6K09en-6RVdGtEHf_ew5qlZPVfkSb3bPr-VyE6siS2Op65qMI6lgEjOxGP_DwkgKmoCRwHJSg5JaKcoISKELnNakWNQUTG4IIXOUnM8q34fgteGf3nbCnzgGPsnzSZ5T4Gf5Ecj-AMoOYrC9G7yw7X_YF_yEXaA</recordid><startdate>20110701</startdate><enddate>20110701</enddate><creator>Kishii, Sadahiro</creator><creator>Hatada, Akiyoshi</creator><creator>Arimoto, Yoshihiro</creator><creator>Kurokawa, Syuhei</creator><creator>Doi, Toshiro K.</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20110701</creationdate><title>Tungsten Film Chemical Mechanical Polishing Using MnO 2 Slurry</title><author>Kishii, Sadahiro ; Hatada, Akiyoshi ; Arimoto, Yoshihiro ; Kurokawa, Syuhei ; Doi, Toshiro K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c842-bedd3dd3b5a6b16a95021afb50e30fb0673d0cbecc5630bae812d389d50f7f333</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2011</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kishii, Sadahiro</creatorcontrib><creatorcontrib>Hatada, Akiyoshi</creatorcontrib><creatorcontrib>Arimoto, Yoshihiro</creatorcontrib><creatorcontrib>Kurokawa, Syuhei</creatorcontrib><creatorcontrib>Doi, Toshiro K.</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kishii, Sadahiro</au><au>Hatada, Akiyoshi</au><au>Arimoto, Yoshihiro</au><au>Kurokawa, Syuhei</au><au>Doi, Toshiro K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Tungsten Film Chemical Mechanical Polishing Using MnO 2 Slurry</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2011-07-01</date><risdate>2011</risdate><volume>50</volume><issue>7R</issue><spage>76502</spage><pages>76502-</pages><issn>1347-4065</issn><issn>0021-4922</issn><eissn>1347-4065</eissn><doi>10.7567/JJAP.50.076502</doi></addata></record>
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title Tungsten Film Chemical Mechanical Polishing Using MnO 2 Slurry
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-08T09%3A40%3A51IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Tungsten%20Film%20Chemical%20Mechanical%20Polishing%20Using%20MnO%202%20Slurry&rft.jtitle=Japanese%20Journal%20of%20Applied%20Physics&rft.au=Kishii,%20Sadahiro&rft.date=2011-07-01&rft.volume=50&rft.issue=7R&rft.spage=76502&rft.pages=76502-&rft.issn=1347-4065&rft.eissn=1347-4065&rft_id=info:doi/10.7567/JJAP.50.076502&rft_dat=%3Ccrossref%3En/a%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true