Preparation of Free-Standing GaN Substrates from Thick GaN Layers Crystallized by Hydride Vapor Phase Epitaxy on Ammonothermally Grown GaN Seeds

Crystallization of GaN by hydride vapor phase epitaxy (HVPE) on ammonothermally grown GaN seed crystals is described. The initial growth conditions for HVPE are determined and applied for further bulk growth. Smooth GaN layers up to 1.1 mm thick and of excellent crystalline quality, without cracks,...

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Veröffentlicht in:Applied physics express 2013-07, Vol.6 (7), p.075504-075504-4
Hauptverfasser: Sochacki, Tomasz, Bryan, Zachary, Amilusik, Mikolaj, Collazo, Ramon, Lucznik, Boleslaw, Weyher, Jan L, Nowak, Grzegorz, Sadovyi, Bogdan, Kamler, Grzegorz, Kucharski, Robert, Zajac, Marcin, Doradzinski, Roman, Dwilinski, Robert, Grzegory, Izabella, Bockowski, Michal, Sitar, Zlatko
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container_issue 7
container_start_page 075504
container_title Applied physics express
container_volume 6
creator Sochacki, Tomasz
Bryan, Zachary
Amilusik, Mikolaj
Collazo, Ramon
Lucznik, Boleslaw
Weyher, Jan L
Nowak, Grzegorz
Sadovyi, Bogdan
Kamler, Grzegorz
Kucharski, Robert
Zajac, Marcin
Doradzinski, Roman
Dwilinski, Robert
Grzegory, Izabella
Bockowski, Michal
Sitar, Zlatko
description Crystallization of GaN by hydride vapor phase epitaxy (HVPE) on ammonothermally grown GaN seed crystals is described. The initial growth conditions for HVPE are determined and applied for further bulk growth. Smooth GaN layers up to 1.1 mm thick and of excellent crystalline quality, without cracks, and with low dislocation density are obtained. Preparation of the free-standing HVPE-GaN crystal by slicing and structural and optical quality of the resulting wafer are presented.
doi_str_mv 10.7567/APEX.6.075504
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title Preparation of Free-Standing GaN Substrates from Thick GaN Layers Crystallized by Hydride Vapor Phase Epitaxy on Ammonothermally Grown GaN Seeds
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