Achieving narrow gaps in micro-nano structures fabricated by maskless optical projection lithography

We propose a strategy to achieve narrow gaps in micro-nano structures by femtosecond (fs) laser maskless optical projection lithography (MOPL) technique. The simulation predicts the trend of each factor affecting the gap width, which agrees with the experimental result. A narrow gap of 243 nm is obt...

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Veröffentlicht in:	Applied physics express 2023-03, Vol.16 (3), p.35005
Hauptverfasser:	Liu, Xiang-Yang, Dong, Xian-Zi, Guo, Min, Jin, Feng, Wang, Tian-Wei, Duan, Xuan-Ming, Zhao, Zhen-Sheng, Zheng, Mei-Ling
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Sprache:	eng
Schlagworte:	femtosecond laser large-area micro-nano structures maskless optical projection lithography narrow gap
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container_title	Applied physics express
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creator	Liu, Xiang-Yang Dong, Xian-Zi Guo, Min Jin, Feng Wang, Tian-Wei Duan, Xuan-Ming Zhao, Zhen-Sheng Zheng, Mei-Ling
description	We propose a strategy to achieve narrow gaps in micro-nano structures by femtosecond (fs) laser maskless optical projection lithography (MOPL) technique. The simulation predicts the trend of each factor affecting the gap width, which agrees with the experimental result. A narrow gap of 243 nm is obtained by optimizing the structure design and processing parameters. Furthermore, large-area functional micro-nano structures with narrow gaps are fabricated. The strategy of optimizing the width of narrow gaps in MOPL is flexible and effective, providing wide application prospects in the fabrication of micro-nano devices in nanophotonics and semiconductors.
doi_str_mv	10.35848/1882-0786/acc3db
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fullrecord	<record><control><sourceid>iop_cross</sourceid><recordid>TN_cdi_crossref_primary_10_35848_1882_0786_acc3db</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>apexacc3db</sourcerecordid><originalsourceid>FETCH-LOGICAL-c316t-df94cc53bc8d7f74301c85d19767a5fff32c28e58f4603569b31010f3a036b073</originalsourceid><addsrcrecordid>eNp1kEtPAyEUhYnRxFr9Ae5YuhmFMgN02TS-kiZudE0YHi11CgSo2n8vtaYrXd2bm3POPfkAuMbolnS85XeY80mDGKd3Uimi-xMwOp5Ojzvj5-Ai5zVCtCWYjoCeqZUzH84voZcphU-4lDFD5-HGqRQaL32AuaStKttkMrSyT07JYjTsd3Aj8_tgcoYhlnodYExhbVRxwcPBlVVYJhlXu0twZuWQzdXvHIO3h_vX-VOzeHl8ns8WjapdSqPttFWqI73imlnWEoQV7zSeMspkZ60lEzXhpuO2pYh0dNoTjDCyRCJCe8TIGOBDbm2eczJWxOQ2Mu0ERuIHk9hzEHsm4oCpem4OHheiWIdt8rWhkNF8CUwFEfURQp2I2lZp84f0_-hvCvJ6Ow</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Achieving narrow gaps in micro-nano structures fabricated by maskless optical projection lithography</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Liu, Xiang-Yang ; Dong, Xian-Zi ; Guo, Min ; Jin, Feng ; Wang, Tian-Wei ; Duan, Xuan-Ming ; Zhao, Zhen-Sheng ; Zheng, Mei-Ling</creator><creatorcontrib>Liu, Xiang-Yang ; Dong, Xian-Zi ; Guo, Min ; Jin, Feng ; Wang, Tian-Wei ; Duan, Xuan-Ming ; Zhao, Zhen-Sheng ; Zheng, Mei-Ling</creatorcontrib><description>We propose a strategy to achieve narrow gaps in micro-nano structures by femtosecond (fs) laser maskless optical projection lithography (MOPL) technique. The simulation predicts the trend of each factor affecting the gap width, which agrees with the experimental result. A narrow gap of 243 nm is obtained by optimizing the structure design and processing parameters. Furthermore, large-area functional micro-nano structures with narrow gaps are fabricated. The strategy of optimizing the width of narrow gaps in MOPL is flexible and effective, providing wide application prospects in the fabrication of micro-nano devices in nanophotonics and semiconductors.</description><identifier>ISSN: 1882-0778</identifier><identifier>EISSN: 1882-0786</identifier><identifier>DOI: 10.35848/1882-0786/acc3db</identifier><identifier>CODEN: APEPC4</identifier><language>eng</language><publisher>IOP Publishing</publisher><subject>femtosecond laser ; large-area micro-nano structures ; maskless optical projection lithography ; narrow gap</subject><ispartof>Applied physics express, 2023-03, Vol.16 (3), p.35005</ispartof><rights>2023 The Japan Society of Applied Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c316t-df94cc53bc8d7f74301c85d19767a5fff32c28e58f4603569b31010f3a036b073</citedby><cites>FETCH-LOGICAL-c316t-df94cc53bc8d7f74301c85d19767a5fff32c28e58f4603569b31010f3a036b073</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.35848/1882-0786/acc3db/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,778,782,27911,27912,53833,53880</link.rule.ids></links><search><creatorcontrib>Liu, Xiang-Yang</creatorcontrib><creatorcontrib>Dong, Xian-Zi</creatorcontrib><creatorcontrib>Guo, Min</creatorcontrib><creatorcontrib>Jin, Feng</creatorcontrib><creatorcontrib>Wang, Tian-Wei</creatorcontrib><creatorcontrib>Duan, Xuan-Ming</creatorcontrib><creatorcontrib>Zhao, Zhen-Sheng</creatorcontrib><creatorcontrib>Zheng, Mei-Ling</creatorcontrib><title>Achieving narrow gaps in micro-nano structures fabricated by maskless optical projection lithography</title><title>Applied physics express</title><addtitle>Appl. Phys. Express</addtitle><description>We propose a strategy to achieve narrow gaps in micro-nano structures by femtosecond (fs) laser maskless optical projection lithography (MOPL) technique. The simulation predicts the trend of each factor affecting the gap width, which agrees with the experimental result. A narrow gap of 243 nm is obtained by optimizing the structure design and processing parameters. Furthermore, large-area functional micro-nano structures with narrow gaps are fabricated. The strategy of optimizing the width of narrow gaps in MOPL is flexible and effective, providing wide application prospects in the fabrication of micro-nano devices in nanophotonics and semiconductors.</description><subject>femtosecond laser</subject><subject>large-area micro-nano structures</subject><subject>maskless optical projection lithography</subject><subject>narrow gap</subject><issn>1882-0778</issn><issn>1882-0786</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><recordid>eNp1kEtPAyEUhYnRxFr9Ae5YuhmFMgN02TS-kiZudE0YHi11CgSo2n8vtaYrXd2bm3POPfkAuMbolnS85XeY80mDGKd3Uimi-xMwOp5Ojzvj5-Ai5zVCtCWYjoCeqZUzH84voZcphU-4lDFD5-HGqRQaL32AuaStKttkMrSyT07JYjTsd3Aj8_tgcoYhlnodYExhbVRxwcPBlVVYJhlXu0twZuWQzdXvHIO3h_vX-VOzeHl8ns8WjapdSqPttFWqI73imlnWEoQV7zSeMspkZ60lEzXhpuO2pYh0dNoTjDCyRCJCe8TIGOBDbm2eczJWxOQ2Mu0ERuIHk9hzEHsm4oCpem4OHheiWIdt8rWhkNF8CUwFEfURQp2I2lZp84f0_-hvCvJ6Ow</recordid><startdate>20230301</startdate><enddate>20230301</enddate><creator>Liu, Xiang-Yang</creator><creator>Dong, Xian-Zi</creator><creator>Guo, Min</creator><creator>Jin, Feng</creator><creator>Wang, Tian-Wei</creator><creator>Duan, Xuan-Ming</creator><creator>Zhao, Zhen-Sheng</creator><creator>Zheng, Mei-Ling</creator><general>IOP Publishing</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20230301</creationdate><title>Achieving narrow gaps in micro-nano structures fabricated by maskless optical projection lithography</title><author>Liu, Xiang-Yang ; Dong, Xian-Zi ; Guo, Min ; Jin, Feng ; Wang, Tian-Wei ; Duan, Xuan-Ming ; Zhao, Zhen-Sheng ; Zheng, Mei-Ling</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c316t-df94cc53bc8d7f74301c85d19767a5fff32c28e58f4603569b31010f3a036b073</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>femtosecond laser</topic><topic>large-area micro-nano structures</topic><topic>maskless optical projection lithography</topic><topic>narrow gap</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Liu, Xiang-Yang</creatorcontrib><creatorcontrib>Dong, Xian-Zi</creatorcontrib><creatorcontrib>Guo, Min</creatorcontrib><creatorcontrib>Jin, Feng</creatorcontrib><creatorcontrib>Wang, Tian-Wei</creatorcontrib><creatorcontrib>Duan, Xuan-Ming</creatorcontrib><creatorcontrib>Zhao, Zhen-Sheng</creatorcontrib><creatorcontrib>Zheng, Mei-Ling</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics express</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Liu, Xiang-Yang</au><au>Dong, Xian-Zi</au><au>Guo, Min</au><au>Jin, Feng</au><au>Wang, Tian-Wei</au><au>Duan, Xuan-Ming</au><au>Zhao, Zhen-Sheng</au><au>Zheng, Mei-Ling</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Achieving narrow gaps in micro-nano structures fabricated by maskless optical projection lithography</atitle><jtitle>Applied physics express</jtitle><addtitle>Appl. Phys. Express</addtitle><date>2023-03-01</date><risdate>2023</risdate><volume>16</volume><issue>3</issue><spage>35005</spage><pages>35005-</pages><issn>1882-0778</issn><eissn>1882-0786</eissn><coden>APEPC4</coden><abstract>We propose a strategy to achieve narrow gaps in micro-nano structures by femtosecond (fs) laser maskless optical projection lithography (MOPL) technique. The simulation predicts the trend of each factor affecting the gap width, which agrees with the experimental result. A narrow gap of 243 nm is obtained by optimizing the structure design and processing parameters. Furthermore, large-area functional micro-nano structures with narrow gaps are fabricated. The strategy of optimizing the width of narrow gaps in MOPL is flexible and effective, providing wide application prospects in the fabrication of micro-nano devices in nanophotonics and semiconductors.</abstract><pub>IOP Publishing</pub><doi>10.35848/1882-0786/acc3db</doi><tpages>4</tpages></addata></record>
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title	Achieving narrow gaps in micro-nano structures fabricated by maskless optical projection lithography
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T18%3A41%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-iop_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Achieving%20narrow%20gaps%20in%20micro-nano%20structures%20fabricated%20by%20maskless%20optical%20projection%20lithography&rft.jtitle=Applied%20physics%20express&rft.au=Liu,%20Xiang-Yang&rft.date=2023-03-01&rft.volume=16&rft.issue=3&rft.spage=35005&rft.pages=35005-&rft.issn=1882-0778&rft.eissn=1882-0786&rft.coden=APEPC4&rft_id=info:doi/10.35848/1882-0786/acc3db&rft_dat=%3Ciop_cross%3Eapexacc3db%3C/iop_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true