Time-resolved measurement of radical populations in extreme-ultraviolet-light-induced hydrogen plasma

We have investigated hydrogen plasma induced by intense extreme ultraviolet (EUV) radiation by measuring the plasma parameters and population density of radicals, which is expected to clean the tin contamination on the optics in EUV sources, using a time-resolved optical emission spectroscopy. The o...

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Veröffentlicht in:	Applied physics express 2022-03, Vol.15 (3), p.36002
Hauptverfasser:	Liu, Chang, Tanaka, Nozomi, Zhu, Baojun, Nishihara, Katsunobu, Fujioka, Shinsuke, Sik Kang, Kyung, Suh, Youngduk, Kim, Jeong-Gil, Ozawa, Ken, Kubo, Minoru
Format:	Artikel
Sprache:	eng
Schlagworte:	extreme ultraviolet lithography hydrogen radical laser optical emission spectroscopy plasma
Online-Zugang:	Volltext
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