Analysis of mitigating factors for line edge roughness generated during electron beam lithography using machine learning

Machine learning has been reported to be useful for the analysis of the trade-off relationships among major properties of chemically amplified extreme ultraviolet resists. The resist materials and processes used in photomask production using electron beam lithography seem similar. However, they invo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Japanese Journal of Applied Physics 2021-07, Vol.60 (7), p.76509
Hauptverfasser:	Jin, Yuqing, Kozawa, Takahiro, Tamura, Takao
Format:	Artikel
Sprache:	eng
Schlagworte:	Electron beam lithography Machine learning Patterning photomask Polynomials regression resist Roughness
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!