Initial states and analog switching behaviors of two major tantalum oxide resistive memories
A systematic study was performed to understand the two major operation modes, valence change memory (VCM) and electrochemical memory (ECM), of tantalum oxide resistive memory, which were categorized by the type of conductive filament. The tantalum oxide insulator layer was predictably fabricated to...
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Veröffentlicht in: | Japanese Journal of Applied Physics 2020-04, Vol.59 (4), p.44004 |
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container_title | Japanese Journal of Applied Physics |
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creator | Li, Yuanlin Tsurumaki-Fukuchi, Atsushi Arita, Masashi Morie, Takashi Takahashi, Yasuo |
description | A systematic study was performed to understand the two major operation modes, valence change memory (VCM) and electrochemical memory (ECM), of tantalum oxide resistive memory, which were categorized by the type of conductive filament. The tantalum oxide insulator layer was predictably fabricated to modify the pristine oxygen-vacancy concentration in the insulator layer, where tantalum and copper top electrodes were used to achieve VCM and ECM modes. The distinguishable characteristics of the initial state and analog resistive switching operation revealed the prerequisites for switching capabilities and demonstrated the effects of oxygen vacancies in the two switching modes. |
doi_str_mv | 10.35848/1347-4065/ab8022 |
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The tantalum oxide insulator layer was predictably fabricated to modify the pristine oxygen-vacancy concentration in the insulator layer, where tantalum and copper top electrodes were used to achieve VCM and ECM modes. The distinguishable characteristics of the initial state and analog resistive switching operation revealed the prerequisites for switching capabilities and demonstrated the effects of oxygen vacancies in the two switching modes.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.35848/1347-4065/ab8022</identifier><identifier>CODEN: JJAPB6</identifier><language>eng</language><publisher>IOP Publishing</publisher><subject>analog resistive switching ; electrochemical memory ; oxygen-vacancy ; resistive memory ; tantalum oxide ; valence change memory</subject><ispartof>Japanese Journal of Applied Physics, 2020-04, Vol.59 (4), p.44004</ispartof><rights>2020 The Japan Society of Applied Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c382t-4875835d789f5b631498d07b710b71fd0bd917088582f6dd560894dd61a448483</citedby><cites>FETCH-LOGICAL-c382t-4875835d789f5b631498d07b710b71fd0bd917088582f6dd560894dd61a448483</cites><orcidid>0000-0001-7220-4289 ; 0000-0003-2529-8897 ; 0000-0002-8604-8392 ; 0000-0003-2708-4307</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.35848/1347-4065/ab8022/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,776,780,27901,27902,53821,53868</link.rule.ids></links><search><creatorcontrib>Li, Yuanlin</creatorcontrib><creatorcontrib>Tsurumaki-Fukuchi, Atsushi</creatorcontrib><creatorcontrib>Arita, Masashi</creatorcontrib><creatorcontrib>Morie, Takashi</creatorcontrib><creatorcontrib>Takahashi, Yasuo</creatorcontrib><title>Initial states and analog switching behaviors of two major tantalum oxide resistive memories</title><title>Japanese Journal of Applied Physics</title><addtitle>Jpn. J. Appl. Phys</addtitle><description>A systematic study was performed to understand the two major operation modes, valence change memory (VCM) and electrochemical memory (ECM), of tantalum oxide resistive memory, which were categorized by the type of conductive filament. The tantalum oxide insulator layer was predictably fabricated to modify the pristine oxygen-vacancy concentration in the insulator layer, where tantalum and copper top electrodes were used to achieve VCM and ECM modes. The distinguishable characteristics of the initial state and analog resistive switching operation revealed the prerequisites for switching capabilities and demonstrated the effects of oxygen vacancies in the two switching modes.</description><subject>analog resistive switching</subject><subject>electrochemical memory</subject><subject>oxygen-vacancy</subject><subject>resistive memory</subject><subject>tantalum oxide</subject><subject>valence change memory</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNp1kEFLAzEQhYMoWKs_wFuOXtZOsslu9ihFbaHgRW9CyDbZNsvuZknSVv-9qRVPehiGGd578D6Ebgnc51wwMSM5KzMGBZ-pWgClZ2jy-zpHEwBKMlZReomuQmjTWXBGJuh9OdhoVYdDVNEErAadRnVug8PBxvXWDhtcm63aW-cDdg2OB4d71TqPoxqi6nY9dh9WG-xNsCHavcG96Z23Jlyji0Z1wdz87Cl6e3p8nS-y1cvzcv6wyta5oDFjouQi57oUVcPrIiesEhrKuiSQptFQ64qUIAQXtCm05gWIimldEMVY6p5PETnlrr0LwZtGjt72yn9KAvIbjzyykEcW8oQnee5OHutG2bqdT6WDbFs1Sl5JJoExACZH3SRp9of0_-gvNft0HA</recordid><startdate>20200401</startdate><enddate>20200401</enddate><creator>Li, Yuanlin</creator><creator>Tsurumaki-Fukuchi, Atsushi</creator><creator>Arita, Masashi</creator><creator>Morie, Takashi</creator><creator>Takahashi, Yasuo</creator><general>IOP Publishing</general><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0001-7220-4289</orcidid><orcidid>https://orcid.org/0000-0003-2529-8897</orcidid><orcidid>https://orcid.org/0000-0002-8604-8392</orcidid><orcidid>https://orcid.org/0000-0003-2708-4307</orcidid></search><sort><creationdate>20200401</creationdate><title>Initial states and analog switching behaviors of two major tantalum oxide resistive memories</title><author>Li, Yuanlin ; Tsurumaki-Fukuchi, Atsushi ; Arita, Masashi ; Morie, Takashi ; Takahashi, Yasuo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c382t-4875835d789f5b631498d07b710b71fd0bd917088582f6dd560894dd61a448483</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>analog resistive switching</topic><topic>electrochemical memory</topic><topic>oxygen-vacancy</topic><topic>resistive memory</topic><topic>tantalum oxide</topic><topic>valence change memory</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Li, Yuanlin</creatorcontrib><creatorcontrib>Tsurumaki-Fukuchi, Atsushi</creatorcontrib><creatorcontrib>Arita, Masashi</creatorcontrib><creatorcontrib>Morie, Takashi</creatorcontrib><creatorcontrib>Takahashi, Yasuo</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Li, Yuanlin</au><au>Tsurumaki-Fukuchi, Atsushi</au><au>Arita, Masashi</au><au>Morie, Takashi</au><au>Takahashi, Yasuo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Initial states and analog switching behaviors of two major tantalum oxide resistive memories</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><addtitle>Jpn. J. Appl. Phys</addtitle><date>2020-04-01</date><risdate>2020</risdate><volume>59</volume><issue>4</issue><spage>44004</spage><pages>44004-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPB6</coden><abstract>A systematic study was performed to understand the two major operation modes, valence change memory (VCM) and electrochemical memory (ECM), of tantalum oxide resistive memory, which were categorized by the type of conductive filament. The tantalum oxide insulator layer was predictably fabricated to modify the pristine oxygen-vacancy concentration in the insulator layer, where tantalum and copper top electrodes were used to achieve VCM and ECM modes. The distinguishable characteristics of the initial state and analog resistive switching operation revealed the prerequisites for switching capabilities and demonstrated the effects of oxygen vacancies in the two switching modes.</abstract><pub>IOP Publishing</pub><doi>10.35848/1347-4065/ab8022</doi><tpages>8</tpages><orcidid>https://orcid.org/0000-0001-7220-4289</orcidid><orcidid>https://orcid.org/0000-0003-2529-8897</orcidid><orcidid>https://orcid.org/0000-0002-8604-8392</orcidid><orcidid>https://orcid.org/0000-0003-2708-4307</orcidid></addata></record> |
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subjects | analog resistive switching electrochemical memory oxygen-vacancy resistive memory tantalum oxide valence change memory |
title | Initial states and analog switching behaviors of two major tantalum oxide resistive memories |
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