Resistive Switching Characteristics of ZnO-Based RRAM on Silicon Substrate

In this work, we conducted the following analysis of Ni/ZnO (20 nm)/n-type Si RRAM device with three different compliance currents (CCs). We compared I-V curves, including set, reset voltages, and resistance of LRS, HRS states for each CCs. For an accurate comparison of each case, statistical analys...

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Veröffentlicht in:Metals (Basel ) 2021-10, Vol.11 (10), p.1572, Article 1572
Hauptverfasser: Kim, Dahye, Shin, Jiwoong, Kim, Sungjun
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Sprache:eng
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Zusammenfassung:In this work, we conducted the following analysis of Ni/ZnO (20 nm)/n-type Si RRAM device with three different compliance currents (CCs). We compared I-V curves, including set, reset voltages, and resistance of LRS, HRS states for each CCs. For an accurate comparison of each case, statistical analysis is presented. In each case, the average value and the relative standard deviation (RSD) of resistance are calculated to analyze the characteristics of the distribution. The best variability is observed at higher CC (5 mA). In addition, we validated the non-volatile properties of the device using the retention data for each of the CCs. Based on this comparison, we proposed the most appropriate CC of the device operation. Also, a pulse was applied to measure the current waveform and demonstrate the regular operation of the device. Finally, the resistance of LRS and HRS states was measured by pulse. We statistically compared the measured pulse data with the DC data.
ISSN:2075-4701
2075-4701
DOI:10.3390/met11101572