Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the su...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Coatings (Basel) 2020-03, Vol.10 (3), p.211
Hauptverfasser: Vladoiu, Rodica, Tichý, Milan, Mandes, Aurelia, Dinca, Virginia, Kudrna, Pavel
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue 3
container_start_page 211
container_title Coatings (Basel)
container_volume 10
creator Vladoiu, Rodica
Tichý, Milan
Mandes, Aurelia
Dinca, Virginia
Kudrna, Pavel
description This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition.
doi_str_mv 10.3390/coatings10030211
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_3390_coatings10030211</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_3390_coatings10030211</sourcerecordid><originalsourceid>FETCH-LOGICAL-c285t-b86da13b1817c3fe3929e3a6376a22cb2472ea9a4d8a9adce540051bfed0e3943</originalsourceid><addsrcrecordid>eNpdkLFOwzAQhi0EElXpzugXCNzZaRKPUaFQqRJL6IQUOc6lNUriyE6HbjwET8iTkAoGxD_c_-t09w8fY7cId1IquDdOj7bfBwSQIBAv2ExAqqIkRnH5J1-zRQjvMEmhzFDN2FtxIN9Z11vDd9ocjx3Pvfn6-Mz5jnyYalviBZlD71q3P_HGeV4cbM_Xtu34Aw0u2HF657qv-WYMPB-G1hp93oUbdtXoNtDi1-fsdf1YrJ6j7cvTZpVvIyOy5RhVWVJrlBVmmBrZkFRCkdSJTBMthKlEnArSSsd1Ns3a0DIGWGLVUA3TcSznDH56jXcheGrKwdtO-1OJUJ4Blf8ByW_GA1zG</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications</title><source>MDPI - Multidisciplinary Digital Publishing Institute</source><source>Alma/SFX Local Collection</source><source>EZB Electronic Journals Library</source><creator>Vladoiu, Rodica ; Tichý, Milan ; Mandes, Aurelia ; Dinca, Virginia ; Kudrna, Pavel</creator><creatorcontrib>Vladoiu, Rodica ; Tichý, Milan ; Mandes, Aurelia ; Dinca, Virginia ; Kudrna, Pavel</creatorcontrib><description>This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition.</description><identifier>ISSN: 2079-6412</identifier><identifier>EISSN: 2079-6412</identifier><identifier>DOI: 10.3390/coatings10030211</identifier><language>eng</language><ispartof>Coatings (Basel), 2020-03, Vol.10 (3), p.211</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c285t-b86da13b1817c3fe3929e3a6376a22cb2472ea9a4d8a9adce540051bfed0e3943</citedby><cites>FETCH-LOGICAL-c285t-b86da13b1817c3fe3929e3a6376a22cb2472ea9a4d8a9adce540051bfed0e3943</cites><orcidid>0000-0003-4024-4838 ; 0000-0003-2393-7050 ; 0000-0002-0803-9861</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Vladoiu, Rodica</creatorcontrib><creatorcontrib>Tichý, Milan</creatorcontrib><creatorcontrib>Mandes, Aurelia</creatorcontrib><creatorcontrib>Dinca, Virginia</creatorcontrib><creatorcontrib>Kudrna, Pavel</creatorcontrib><title>Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications</title><title>Coatings (Basel)</title><description>This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition.</description><issn>2079-6412</issn><issn>2079-6412</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNpdkLFOwzAQhi0EElXpzugXCNzZaRKPUaFQqRJL6IQUOc6lNUriyE6HbjwET8iTkAoGxD_c_-t09w8fY7cId1IquDdOj7bfBwSQIBAv2ExAqqIkRnH5J1-zRQjvMEmhzFDN2FtxIN9Z11vDd9ocjx3Pvfn6-Mz5jnyYalviBZlD71q3P_HGeV4cbM_Xtu34Aw0u2HF657qv-WYMPB-G1hp93oUbdtXoNtDi1-fsdf1YrJ6j7cvTZpVvIyOy5RhVWVJrlBVmmBrZkFRCkdSJTBMthKlEnArSSsd1Ns3a0DIGWGLVUA3TcSznDH56jXcheGrKwdtO-1OJUJ4Blf8ByW_GA1zG</recordid><startdate>20200301</startdate><enddate>20200301</enddate><creator>Vladoiu, Rodica</creator><creator>Tichý, Milan</creator><creator>Mandes, Aurelia</creator><creator>Dinca, Virginia</creator><creator>Kudrna, Pavel</creator><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0003-4024-4838</orcidid><orcidid>https://orcid.org/0000-0003-2393-7050</orcidid><orcidid>https://orcid.org/0000-0002-0803-9861</orcidid></search><sort><creationdate>20200301</creationdate><title>Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications</title><author>Vladoiu, Rodica ; Tichý, Milan ; Mandes, Aurelia ; Dinca, Virginia ; Kudrna, Pavel</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c285t-b86da13b1817c3fe3929e3a6376a22cb2472ea9a4d8a9adce540051bfed0e3943</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Vladoiu, Rodica</creatorcontrib><creatorcontrib>Tichý, Milan</creatorcontrib><creatorcontrib>Mandes, Aurelia</creatorcontrib><creatorcontrib>Dinca, Virginia</creatorcontrib><creatorcontrib>Kudrna, Pavel</creatorcontrib><collection>CrossRef</collection><jtitle>Coatings (Basel)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Vladoiu, Rodica</au><au>Tichý, Milan</au><au>Mandes, Aurelia</au><au>Dinca, Virginia</au><au>Kudrna, Pavel</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications</atitle><jtitle>Coatings (Basel)</jtitle><date>2020-03-01</date><risdate>2020</risdate><volume>10</volume><issue>3</issue><spage>211</spage><pages>211-</pages><issn>2079-6412</issn><eissn>2079-6412</eissn><abstract>This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition.</abstract><doi>10.3390/coatings10030211</doi><orcidid>https://orcid.org/0000-0003-4024-4838</orcidid><orcidid>https://orcid.org/0000-0003-2393-7050</orcidid><orcidid>https://orcid.org/0000-0002-0803-9861</orcidid><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 2079-6412
ispartof Coatings (Basel), 2020-03, Vol.10 (3), p.211
issn 2079-6412
2079-6412
language eng
recordid cdi_crossref_primary_10_3390_coatings10030211
source MDPI - Multidisciplinary Digital Publishing Institute; Alma/SFX Local Collection; EZB Electronic Journals Library
title Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-20T15%3A40%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Thermionic%20Vacuum%20Arc%E2%80%94A%20Versatile%20Technology%20for%20Thin%20Film%20Deposition%20and%20Its%20Applications&rft.jtitle=Coatings%20(Basel)&rft.au=Vladoiu,%20Rodica&rft.date=2020-03-01&rft.volume=10&rft.issue=3&rft.spage=211&rft.pages=211-&rft.issn=2079-6412&rft.eissn=2079-6412&rft_id=info:doi/10.3390/coatings10030211&rft_dat=%3Ccrossref%3E10_3390_coatings10030211%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true