Magnetic Properties and Film Structure in Sputtered Amorphous TbCo Films

Magnetic Properties and Film Structure in Sputtered Amorphous TbCo Films

Dependence of magnetic properties on sputtering conditions is studied in amorphous TbCo films. Perpendicular magnetic anisotropy constant Ku depends strongly on Ar pressure and negative substrate bias voltage VB. When deposited at 10 mTorr Ar pressure without VB or with applying VB of-100 V, the fil...

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Veröffentlicht in:SHINKU 1986/04/20, Vol.29(4), pp.206-211
Hauptverfasser: OHKOSHI, Masatoshi, HARADA, Mitsuaki, OHBAYASHI, Shigeki, HONDA, Shigeo, KUSUDA, Tetsuzo
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container_end_page 211
container_issue 4
container_start_page 206
container_title SHINKU
container_volume 29
creator OHKOSHI, Masatoshi
HARADA, Mitsuaki
OHBAYASHI, Shigeki
HONDA, Shigeo
KUSUDA, Tetsuzo
description Dependence of magnetic properties on sputtering conditions is studied in amorphous TbCo films. Perpendicular magnetic anisotropy constant Ku depends strongly on Ar pressure and negative substrate bias voltage VB. When deposited at 10 mTorr Ar pressure without VB or with applying VB of-100 V, the film has positive Ku of 106 erg/cm3 and the hysteresis loop measured perpendicular to the film plane is quite rectangular. Changes in film composition, film structure, and internal stress are investigated also for Ar pressure and substrate bias. The large perpendicular magnetic anisotropy is associated with an ordered fiber structure which comes from moderate bombardment of energetic species.
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title Magnetic Properties and Film Structure in Sputtered Amorphous TbCo Films
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