Nb Thin Films Fabricated by Magnetic Field Distribution Variable-type Facing Target Sputtering System

We have newly devised a magnetic field distribution variable-type facing target sputtering system. The magnetic field distribution between facing targets can be easily changed by moving a magnet without breaking the vacuum. This function can realize with one cathode about both low-damage-sputtering...

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Veröffentlicht in:	Journal of the Vacuum Society of Japan 2011, Vol.54(3), pp.181-183
Hauptverfasser:	MOROHASHI, Shinichi, MASUMOTO, Yuichi, TANAKA, Kozo, USUI, Keita, KOMATSU, Eiji
Format:	Artikel
Sprache:	eng ; jpn
Online-Zugang:	Volltext
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