Nb Thin Films Fabricated by Magnetic Field Distribution Variable-type Facing Target Sputtering System

Nb Thin Films Fabricated by Magnetic Field Distribution Variable-type Facing Target Sputtering System

We have newly devised a magnetic field distribution variable-type facing target sputtering system. The magnetic field distribution between facing targets can be easily changed by moving a magnet without breaking the vacuum. This function can realize with one cathode about both low-damage-sputtering...

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Veröffentlicht in:Journal of the Vacuum Society of Japan 2011, Vol.54(3), pp.181-183
Hauptverfasser: MOROHASHI, Shinichi, MASUMOTO, Yuichi, TANAKA, Kozo, USUI, Keita, KOMATSU, Eiji
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container_end_page 183
container_issue 3
container_start_page 181
container_title Journal of the Vacuum Society of Japan
container_volume 54
creator MOROHASHI, Shinichi
MASUMOTO, Yuichi
TANAKA, Kozo
USUI, Keita
KOMATSU, Eiji
description We have newly devised a magnetic field distribution variable-type facing target sputtering system. The magnetic field distribution between facing targets can be easily changed by moving a magnet without breaking the vacuum. This function can realize with one cathode about both low-damage-sputtering and high-rate-sputtering, and offer a newly thin film fabrication method. By changing the magnetic field distribution between facing targets, Niobium deposition rate has changed three or more times with the same sputtering conditions, such as RF applied electric power and Argon pressure.
doi_str_mv 10.3131/jvsj2.54.181
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title Nb Thin Films Fabricated by Magnetic Field Distribution Variable-type Facing Target Sputtering System
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