Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology

The goal of the SFIL development program is to enable patterning of sub-100nm features at room temperature and with minimal applied pressure. We believe the use of low viscosity materials and photopolymerization chemistry will enable SFIL to achieve the throughput required for use in the microelectr...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2002, Vol.15(3), pp.481-486
Hauptverfasser:	Bailey, T.C., Johnson, S.C., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G., Resnick, D.J.
Format:	Artikel
Sprache:	eng
Schlagworte:	acrylate imprint lithography nanoimprint step and flash
Online-Zugang:	Volltext
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