Oxide-TFT technologies for next-generation AMOLED displays
— High‐mobility high‐reliability low‐RC‐delay oxide TFTs have been developed. Their performances are good enough for AMOLED displays even for the large‐sized super‐high‐resolution, or high‐frame‐rate displays. In this paper, the status of oxide‐TFT development and the issues for the mass‐production...
Gespeichert in:
| Veröffentlicht in: | Journal of the Society for Information Display 2012-03, Vol.20 (3), p.156-161 |
|---|---|
| 1. Verfasser: | |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 161 |
|---|---|
| container_issue | 3 |
| container_start_page | 156 |
| container_title | Journal of the Society for Information Display |
| container_volume | 20 |
| creator | Arai, Toshiaki |
| description | — High‐mobility high‐reliability low‐RC‐delay oxide TFTs have been developed. Their performances are good enough for AMOLED displays even for the large‐sized super‐high‐resolution, or high‐frame‐rate displays. In this paper, the status of oxide‐TFT development and the issues for the mass‐production of next‐generation AMOLED displays will be discussed, and three types of AMOLED displays using different oxide materials and TFT structures will be demonstrated. |
| doi_str_mv | 10.1889/JSID20.3.156 |
| format | Article |
| fullrecord | <record><control><sourceid>istex_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1889_JSID20_3_156</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>ark_67375_WNG_XVS5L7JL_2</sourcerecordid><originalsourceid>FETCH-LOGICAL-c3822-25535270a23532359374d76b8bfc3e85672930e4b96d498b48ae82c3c087c78b3</originalsourceid><addsrcrecordid>eNp9kMtOwzAQRS0EEqWw4wPyAbg4nvgRdlVfFAW6aHnsLMdxiiEklR2J9u8JBLFkMZoZ6dyRziB0GZNRLGV6fbdeTikZwShm_AgN4hQkBs7EcTcTEWOSUnqKzkJ4I4RylvABulntXWHxZr6JWmte66Zqts6GqGx8VNt9i7e2tl63rqmj8f0qm02jwoVdpQ_hHJ2Uugr24rcP0eN8tpnc4my1WE7GGTYgKcWUMWBUEE2BQVcpiKQQPJd5acBKxgVNgdgkT3mRpDJPpLaSGjBECiNkDkN01d81vgnB21LtvPvQ_qBior69Ve-tQHXeHU57_NNV9vAv-7N0X6JdCPchF1q7_wtp_664AMHU88NCvTytWSbuMkXhC5F7Z0o</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Oxide-TFT technologies for next-generation AMOLED displays</title><source>Access via Wiley Online Library</source><creator>Arai, Toshiaki</creator><creatorcontrib>Arai, Toshiaki</creatorcontrib><description>— High‐mobility high‐reliability low‐RC‐delay oxide TFTs have been developed. Their performances are good enough for AMOLED displays even for the large‐sized super‐high‐resolution, or high‐frame‐rate displays. In this paper, the status of oxide‐TFT development and the issues for the mass‐production of next‐generation AMOLED displays will be discussed, and three types of AMOLED displays using different oxide materials and TFT structures will be demonstrated.</description><identifier>ISSN: 1071-0922</identifier><identifier>EISSN: 1938-3657</identifier><identifier>DOI: 10.1889/JSID20.3.156</identifier><language>eng</language><publisher>Oxford, UK: Blackwell Publishing Ltd</publisher><subject>Al2O3 passivation ; bottom gate ; IGZO ; ITZO ; OLED ; Oxide TFT ; top gate</subject><ispartof>Journal of the Society for Information Display, 2012-03, Vol.20 (3), p.156-161</ispartof><rights>2012 Society for Information Display</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3822-25535270a23532359374d76b8bfc3e85672930e4b96d498b48ae82c3c087c78b3</citedby><cites>FETCH-LOGICAL-c3822-25535270a23532359374d76b8bfc3e85672930e4b96d498b48ae82c3c087c78b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1889%2FJSID20.3.156$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1889%2FJSID20.3.156$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1417,27924,27925,45574,45575</link.rule.ids></links><search><creatorcontrib>Arai, Toshiaki</creatorcontrib><title>Oxide-TFT technologies for next-generation AMOLED displays</title><title>Journal of the Society for Information Display</title><description>— High‐mobility high‐reliability low‐RC‐delay oxide TFTs have been developed. Their performances are good enough for AMOLED displays even for the large‐sized super‐high‐resolution, or high‐frame‐rate displays. In this paper, the status of oxide‐TFT development and the issues for the mass‐production of next‐generation AMOLED displays will be discussed, and three types of AMOLED displays using different oxide materials and TFT structures will be demonstrated.</description><subject>Al2O3 passivation</subject><subject>bottom gate</subject><subject>IGZO</subject><subject>ITZO</subject><subject>OLED</subject><subject>Oxide TFT</subject><subject>top gate</subject><issn>1071-0922</issn><issn>1938-3657</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNp9kMtOwzAQRS0EEqWw4wPyAbg4nvgRdlVfFAW6aHnsLMdxiiEklR2J9u8JBLFkMZoZ6dyRziB0GZNRLGV6fbdeTikZwShm_AgN4hQkBs7EcTcTEWOSUnqKzkJ4I4RylvABulntXWHxZr6JWmte66Zqts6GqGx8VNt9i7e2tl63rqmj8f0qm02jwoVdpQ_hHJ2Uugr24rcP0eN8tpnc4my1WE7GGTYgKcWUMWBUEE2BQVcpiKQQPJd5acBKxgVNgdgkT3mRpDJPpLaSGjBECiNkDkN01d81vgnB21LtvPvQ_qBior69Ve-tQHXeHU57_NNV9vAv-7N0X6JdCPchF1q7_wtp_664AMHU88NCvTytWSbuMkXhC5F7Z0o</recordid><startdate>201203</startdate><enddate>201203</enddate><creator>Arai, Toshiaki</creator><general>Blackwell Publishing Ltd</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>201203</creationdate><title>Oxide-TFT technologies for next-generation AMOLED displays</title><author>Arai, Toshiaki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3822-25535270a23532359374d76b8bfc3e85672930e4b96d498b48ae82c3c087c78b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Al2O3 passivation</topic><topic>bottom gate</topic><topic>IGZO</topic><topic>ITZO</topic><topic>OLED</topic><topic>Oxide TFT</topic><topic>top gate</topic><toplevel>online_resources</toplevel><creatorcontrib>Arai, Toshiaki</creatorcontrib><collection>Istex</collection><collection>CrossRef</collection><jtitle>Journal of the Society for Information Display</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Arai, Toshiaki</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Oxide-TFT technologies for next-generation AMOLED displays</atitle><jtitle>Journal of the Society for Information Display</jtitle><date>2012-03</date><risdate>2012</risdate><volume>20</volume><issue>3</issue><spage>156</spage><epage>161</epage><pages>156-161</pages><issn>1071-0922</issn><eissn>1938-3657</eissn><abstract>— High‐mobility high‐reliability low‐RC‐delay oxide TFTs have been developed. Their performances are good enough for AMOLED displays even for the large‐sized super‐high‐resolution, or high‐frame‐rate displays. In this paper, the status of oxide‐TFT development and the issues for the mass‐production of next‐generation AMOLED displays will be discussed, and three types of AMOLED displays using different oxide materials and TFT structures will be demonstrated.</abstract><cop>Oxford, UK</cop><pub>Blackwell Publishing Ltd</pub><doi>10.1889/JSID20.3.156</doi><tpages>6</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 1071-0922 |
| ispartof | Journal of the Society for Information Display, 2012-03, Vol.20 (3), p.156-161 |
| issn | 1071-0922 1938-3657 |
| language | eng |
| recordid | cdi_crossref_primary_10_1889_JSID20_3_156 |
| source | Access via Wiley Online Library |
| subjects | Al2O3 passivation bottom gate IGZO ITZO OLED Oxide TFT top gate |
| title | Oxide-TFT technologies for next-generation AMOLED displays |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T18%3A29%3A42IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-istex_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Oxide-TFT%20technologies%20for%20next-generation%20AMOLED%20displays&rft.jtitle=Journal%20of%20the%20Society%20for%20Information%20Display&rft.au=Arai,%20Toshiaki&rft.date=2012-03&rft.volume=20&rft.issue=3&rft.spage=156&rft.epage=161&rft.pages=156-161&rft.issn=1071-0922&rft.eissn=1938-3657&rft_id=info:doi/10.1889/JSID20.3.156&rft_dat=%3Cistex_cross%3Eark_67375_WNG_XVS5L7JL_2%3C/istex_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |