27.4: Nanoimprinting Lithography as Novel Tool Inducing Self-Aligned Liquid Crystals For Alignment Layer

Polymerizable nematic liquid crystal (LC) was applied as resist for our newly developed nanoimprinting lithography process. The LC resist was self‐aligned during imprinting process at very low impriting pressure, 1.5 bar and the patterned area was able to achieve 4×4 cm2. The optical anisotropic was...

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Veröffentlicht in:	SID International Symposium Digest of technical papers 2006-06, Vol.37 (1), p.1265-1267
Hauptverfasser:	Chen, Huang-Ming Philip, Chiu, Chih-Ho, Kuo, Hui-Lung, Chen, Pin-Cheng, Wen, Chun-Hsiang, Liu, Yi-Chun
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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