Layer-thickness simulation for static thin-film deposition on Gen 6/Gen 7 substrates

— The movement of particles from a target to a substrate during the sputter process was studied using the Monte Carlo Simulation technique. The momentum and energy distribution of the ejected particles were taken into account along with the change of momentum and energy in their collisions with gas...

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Veröffentlicht in:	Journal of the Society for Information Display 2006-01, Vol.14 (1), p.31-36
Hauptverfasser:	Lopp, Andreas, Bangert, Stefan, Buschbeck, Wolfgang, Hanika, Markus, König, Michael, Krempel-Hesse, Jörg, Rost, Harald, Schroeder, Jürgen, Stolley, Tobias
Format:	Artikel
Sprache:	eng
Schlagworte:	layer thickness distribution Monte Carlo simulation pressure reduction sputter process
Online-Zugang:	Volltext
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