A study of ruthenium ultrathin film nucleation on pretreated SiO 2 and Hf–silicate dielectric surfaces

This study explored the effects of substrate surface pretreatments on the nucleation and growth of metal–organic chemical vapor deposited ruthenium. In situ plasma (dry), featuring O 2 , Ar, and H 2 /Ar chemistries, and ex situ (wet) treatments, consisting of a standard RCA bath, were examined in th...

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Veröffentlicht in:	Journal of materials research 2007-08, Vol.22 (8), p.2254-2264
Hauptverfasser:	Papadatos, Filippos, Consiglio, Steven, Skordas, Spyridon, Eisenbraun, Eric T., Kaloyeros, Alain E.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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