Heavily Si-doped InAs photoluminescence measurements

In this paper, we present experimental results of photoluminescence for series of InAs:Si heavily doped samples, with doping level varying from 1.6 × 10 cm to 2.93 × 10 cm . All samples were grown using MBE system equipped with a valved arsenic cracker. The measurements were performed in the tempera...

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Veröffentlicht in:Materials science--Poland 2017-10, Vol.35 (3), p.647-650
Hauptverfasser: Grodecki, Kacper, Murawski, Krzysztof, Henig, Aleksandra, Michalczewski, Krystian, Benyahia, Djalal, Kubiszyn, Łukasz, Martyniuk, Piotr
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container_issue 3
container_start_page 647
container_title Materials science--Poland
container_volume 35
creator Grodecki, Kacper
Murawski, Krzysztof
Henig, Aleksandra
Michalczewski, Krystian
Benyahia, Djalal
Kubiszyn, Łukasz
Martyniuk, Piotr
description In this paper, we present experimental results of photoluminescence for series of InAs:Si heavily doped samples, with doping level varying from 1.6 × 10 cm to 2.93 × 10 cm . All samples were grown using MBE system equipped with a valved arsenic cracker. The measurements were performed in the temperature range of 20 K to 100 K. Although the Mott transition in InAs appears for electron concentrations above 10 cm , Burstein-Moss broadening of photoluminescence spectra presented in this article was observed only for samples with concentration higher than 2 × 10 cm . For the samples with lower concentrations two peaks were observed, arising from the band gap and defect states. The intensity of the defect peak was found to be decreasing with increasing temperature as well as increasing concentration, up to the point of disappearance when the Burstein-Moss broadening was visible.
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subjects Burstein-Moss
heavy doping
In As
photoluminescence
title Heavily Si-doped InAs photoluminescence measurements
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