Behavior Study of Annealing Temperature on Microstructure and Wettability of Electrodeposited ZnO Thin Films for Microcapacitor Application

In this work, electrodeposition was used to produce thin zinc oxide layers on n-type silicon substrates. It has been investigated how annealing at 400∘C affects the deposit's morphological and structural characteristics. SEM, X-ray diffraction, and contact angle measurements have all been used...

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Veröffentlicht in:	Journal of new materials for electrochemical systems 2022-10, Vol.25 (4), p.293-300
Hauptverfasser:	Debbab, Moustafa, Ghellai, Nassera, Ikumapayi, Omolayo M., Gabouze, Noureddine, Lorenzini, Giulio, Yaddadene, Chafiaa, Berouaken, Malika, Menni, Younes
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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