Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications

Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications

We report the initial results of a large-scale evaluation of production-grade fused silica and calcium fluoride to be used in 193-nm lithographic applications. The samples have been provided by many different suppliers of materials. A marathon irradiation chamber permits simultaneous exposure of as...

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Veröffentlicht in:Optics letters 1999-01, Vol.24 (1), p.58
Hauptverfasser: Liberman, V, Rothschild, M, Sedlacek, J H, Uttaro, R S, Grenville, A, Bates, A K, Van Peski, C
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container_start_page 58
container_title Optics letters
container_volume 24
creator Liberman, V
Rothschild, M
Sedlacek, J H
Uttaro, R S
Grenville, A
Bates, A K
Van Peski, C
description We report the initial results of a large-scale evaluation of production-grade fused silica and calcium fluoride to be used in 193-nm lithographic applications. The samples have been provided by many different suppliers of materials. A marathon irradiation chamber permits simultaneous exposure of as many as 36 samples at 800 Hz, at fluences from 0.2 to > or =4 (mJ/cm(2))/pulse and pulse counts in excess of 10(9) . The initial absorption and the laser-induced absorption are found to vary over a wide range. The compaction of each fused-silica sample follows a power law, but its parameters can differ widely from sample to sample.
doi_str_mv 10.1364/OL.24.000058
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title Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications
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