Arbitrary Thermal History Control of Wafer in Photo Resist Processing Using Integrated Heating and Cooling Plate

For photo resist processing in semiconductor manufacturing, the precise temperature control of wafer has been demanded to realize a more fine device in recent years. However, it is difficult to achieve the precise temperature control by a current wafer heating and cooling system, because the system...

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Veröffentlicht in:	TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C 2005/01/25, Vol.71(701), pp.221-228
Hauptverfasser:	BANDOH, Kenichi, MINONISHI, Mikio, YOKOTA, Shinichi
Format:	Artikel
Sprache:	eng ; jpn
Schlagworte:	In-Process Estimation Integrated Heating and Cooling Plate Modeling Observer Photo Resist Processing Process Control
Online-Zugang:	Volltext
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