Homogeneous Thermal Oxidation of Acetone Behind Reflected Shock Wave

The thermal oxidation of acetone mixture, highly diluted with argon, has been observed in the mixtures of 0.02-0.5% acetone and 0.04-10% oxygen using UV absorption and IR emission. The experiments were performed behind reflected shock wave at temperatures 1200 1700K and at densities (2-9)×(10)5mol/c...

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Veröffentlicht in:Nihon Kikai Gakkai rombunshuu. B hen 2001/11/25, Vol.67(663), pp.2797-2804
Hauptverfasser: TSUBOI, Takao, ISHII, Kazuhiro, TAMURA, Shigeru
Format: Artikel
Sprache:eng ; jpn
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Zusammenfassung:The thermal oxidation of acetone mixture, highly diluted with argon, has been observed in the mixtures of 0.02-0.5% acetone and 0.04-10% oxygen using UV absorption and IR emission. The experiments were performed behind reflected shock wave at temperatures 1200 1700K and at densities (2-9)×(10)5mol/cm3. The time histories of absorption intensity at 270nm and emission at 3.4μm due to CH3COCH3, absorption intensity at 310nm due to OH, emission intensity at 4.2μm due to CO2, and emission intensity at 4.7μm due to CO and CO2 were followed. The oxidation scheme CH3COCH3 CH3CO CH3 (C2H6) C2H4 CH2O (H2C2O) CO CO2- was obtained by comparing the experimental profiles with the profiles of computer simulation. The rate of acetone decomposition influenced the induction period of the oxidation.
ISSN:0387-5016
1884-8346
DOI:10.1299/kikaib.67.2797