Influence of thermal annealing on structural, morphological, optical and electrical properties of NiO-Cu composite thin films

p-type NiO-Cu composite thin films were deposited using DC reactive magnetron sputtering technique. The deposited films were annealed in air at different temperatures and characterized for studying the structural, morphological, compositional, optical and electrical properties. X-ray diffraction ana...

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Veröffentlicht in:	Materials express 2014-02, Vol.4 (1), p.32-40
Hauptverfasser:	Reddy, Y. Ashok Kumar, Ajitha, Reddy, P. Sreedhara
Format:	Artikel
Sprache:	eng
Schlagworte:	Annealing Temperature Grain Size Nio-Cu Composite Films Resistivity Sputtering
Online-Zugang:	Volltext
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