On the Acceleration of Cu Electrodeposition by TBPS (3,3-thiobis-1-propanesulfonic acid): A Combined Electrochemical, STM, NMR, ESI-MS and DFT Study

Galvanostatic potential/time transient measurements confirm TBPS (3,3-thiobis-1-propanesulfonic acid, as received) as accelerant for copper electrodeposition.In-situ STM data reveal, however, identical structure motifs on single crystalline Cu(100) model substrates when exposed to TBPS containing el...

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Veröffentlicht in:	Journal of the Electrochemical Society 2013-01, Vol.160 (12), p.D3158-D3164
Hauptverfasser:	Hai, N. T. M., Furrer, J., Gjuroski, I., Bircher, M. P., Cascella, M., Broekmann, P.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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