Editors' Choice—Control of Si 3 N 4 Etching Kinetics and Selectivity to SiO 2 by the Additives in Superheated Water

Editors' Choice—Control of Si 3 N 4 Etching Kinetics and Selectivity to SiO 2 by the Additives in Superheated Water

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Veröffentlicht in:ECS journal of solid state science and technology 2019, Vol.8 (4), p.N85-N91
Hauptverfasser: Son, Changjin, Lim, Sangwoo
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Sprache:eng
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container_title ECS journal of solid state science and technology
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title Editors' Choice—Control of Si 3 N 4 Etching Kinetics and Selectivity to SiO 2 by the Additives in Superheated Water
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