Review—Silicon Carbide Thin Film Technologies: Recent Advances in Processing, Properties, and Applications: Part II. PVD and Alternative (Non-PVD and Non-CVD) Deposition Techniques

Silicon carbide (SiC x ) thin films deposition processes fall primarily into three main categories: (1) chemical vapor deposition (CVD) and its variants, including plasma enhanced CVD (PE-CVD); (2) physical vapor deposition (PVD), including various forms of sputtering; (3) alternative (non-CVD and n...

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Veröffentlicht in:ECS journal of solid state science and technology 2024-04, Vol.13 (4), p.43001
Hauptverfasser: Kaloyeros, Alain E., Arkles, Barry
Format: Artikel
Sprache:eng
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