Fundamentals of III-V Semiconductor Electrochemistry and Wet Etching Processes: Br 2 Etching Properties onto InP
Etching mechanism, of HBr/Br2 solutions on InP, is studied using approaches as electrochemical characterization XPS analyses, Indium dosage by GF-AAS, SEM analysis of cross sectional shapes of etching features. As on GaAs we observed the characteristic opposition toward the dark reduction of Br2 for...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Tagungsbericht |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!