Clean Mode Al Etch Process Development for Defect Reduction

Clean mode chamber condition controlling provides a good method to improve Al etch defect performance. In the same time, it brings significant difference of physical performance such as CD, side wall, corrosion etc. In this study, in order to maintain clean chamber condition, Wafer-less Auto Clean(W...

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Bibliographische Detailangaben

Hauptverfasser:	Qiang, Fan, Huang, Cheng Lien, Hendrianto, Jemmy, Song, Jeff, Lv, Mil, Wang, Ken, Shi, Cris
Format:	Tagungsbericht
Sprache:	eng
Online-Zugang:	Volltext
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