(Invited) Atomic Layer Deposition on Polymers: Applications to Physical Encapsulation of Electrospun Nylon Nanofibers

Nanofibers formed by electrospinning provide large surface areas which enable enhanced material performance in filtration and product separation. In this work, we explore atomic layer deposition (ALD) as a means to encapsulate and protect electrospun nylon-6 nanofibers. Exposing nylon to trimethyl aluminum (TMA) during ALD of aluminum oxide results in significant fiber degradation. Protecting fibers with a bilayer of ALD ZnO and an organic-inorganic hybrid polymer by molecular layer deposition maintains the shape of the original nanofibers, but chemical modification is still detected. These coating processes may help enable nanofibers with stable physical properties under chemical exposure.