Formation and Characterization of Thin Silicon Dioxide Films Obtained by Inductively-Coupled High-Density Plasmas using a Dual Rotated Spiral Antenna System

Thin silicon dioxide films were obtained by low-temperature plasma oxidation. Plasma oxidation was performed using a specially-designed new plasma source, called dual rotated spiral antenna (DuRoSA) system. This new plasma source produced high density plasmas (~ 1012 cm-3) having relatively low elec...

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Hauptverfasser:	Kim, Yil Wook, Woo, Sang Ho, Kim, Hai-Won, Um, Pyung Yong, Ji, Jung-Min, Kim, Chang-Koo
Format:	Tagungsbericht
Sprache:	eng
Online-Zugang:	Volltext
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