Effect of Silylation Hardening on the Electrical Characteristics of Mesoporous Pure Silica Zeolite Film
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| Veröffentlicht in: | Journal of the Electrochemical Society 2009, Vol.156 (2), p.H98 |
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| Sprache: | eng |
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| container_issue | 2 |
| container_start_page | H98 |
| container_title | Journal of the Electrochemical Society |
| container_volume | 156 |
| creator | Seo, T. Yoshino, T. Ohnuki, N. Seino, Y. Cho, Y. Hata, N. Kikkawa, T. |
| description | |
| doi_str_mv | 10.1149/1.3021041 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0013-4651 |
| ispartof | Journal of the Electrochemical Society, 2009, Vol.156 (2), p.H98 |
| issn | 0013-4651 |
| language | eng |
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| source | Institute of Physics Journals |
| title | Effect of Silylation Hardening on the Electrical Characteristics of Mesoporous Pure Silica Zeolite Film |
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