Novel Highly Volatile MOCVD Precursors for Ta2O5 and Nb2O5 Thin Films

Novel Ta and Nb compounds Ta(NtBu)(OtBu)3 (1) and Nb(NtBu)(OtBu)3 (2) were prepared as volatile liquid precursors for the MOCVD process. Ta2O5 and Nb2O5 films were obtained by using 1 and 2 in a lower temperature regime than pentaethoxy tantalum (PET) and pentaethoxy niobium (PEN). The deposition ra...

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Veröffentlicht in:	ECS transactions 2008-10, Vol.16 (5), p.243-251
Hauptverfasser:	Yotsuya, Tadahiro, Chiba, Hirokazu, Furukawa, Taishi, Yamamoto, Toshiki, Inaba, Koichiro, Tada, Ken-ichi, Suzuki, Takao, Fujimoto, Koichi, Funakubo, Hiroshi, Yamakawa, Tetsu, Oshima, Noriaki
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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