Effects of OH Radicals on Formation of Cu Oxide and Polishing Performance in Cu Chemical Mechanical Polishing
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Veröffentlicht in: | Electrochemical and solid-state letters 2008, Vol.11 (2), p.H32 |
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container_issue | 2 |
container_start_page | H32 |
container_title | Electrochemical and solid-state letters |
container_volume | 11 |
creator | Kang, Min Cheol Nam, Ho-Seong Won, Ho Youn Jeong, Sukhoon Jeong, Haedo Kim, Jae Jeong |
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doi_str_mv | 10.1149/1.2817518 |
format | Article |
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source | IOP Publishing Journals |
title | Effects of OH Radicals on Formation of Cu Oxide and Polishing Performance in Cu Chemical Mechanical Polishing |
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