Detection of Precursor Molecules in the MCR-CVD (metal chloride reduction-chemical vapor deposition) of Copper

Gaseous metal chlorides can be precursors in a novel CVD method called metal chloride reduction-chemical vapor deposition (MCR-CVD). In the present study, we focused on the etching process of MCR-CVD of copper. There are more than one species in the gas phase of copper chlorides, which are considere...

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Bibliographische Detailangaben

Hauptverfasser:	Hibi, Atsushi, Susa, Akio, Koshi, Mitsuo
Format:	Tagungsbericht
Sprache:	eng
Online-Zugang:	Volltext
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