Oxide Dielectrics for Reliable Passivation of AlGaN/GaN HEMTs and Insulated Gates
Dielectric oxides of scandium and magnesium have been employed as a surface passivation on AlGaN/GaN HEMT devices. Research to discover a lower lattice mismatch oxide to further reduce the interface trap density and increase oxide/nitride stability has lead to adding calcium to the MgO to create a c...
Gespeichert in:
Hauptverfasser: | , , , , , , , , , , , |
---|---|
Format: | Tagungsbericht |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!