Sputtering Deposition Parameters and Their Interactions in Amorphous Tungsten Oxide Thin Film as Electrochromic Electrode

Amorphous tungsten oxide (a-WO3) thin films were deposited as electrochromic electrodes on ITO coated glass substrates via reactive DC magnetron sputtering from metallic tungsten target. A two-level full-factorial design-of-experiment (DoE) was carried out with the following variables: 1) sputter ta...

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Bibliographische Detailangaben

Hauptverfasser:	Widjaja, Edy J., Delporte, Gerdy, Larsson, Anna-Lena
Format:	Tagungsbericht
Sprache:	eng
Online-Zugang:	Volltext
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