Low-k SiBN (Silicon Boron Nitride) Film Synthesized by a Plasma-Assisted Atomic Layer Deposition

In this study, SiBN films were prepared by plasma assisted atomic layer deposition (PAALD) using dichlorosilane, boron trichloride and ammonia as source gases. In this material system, the reaction control of boron, silicon and nitrogen is a key issue because nitrogen reacts more readily with boron...

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Veröffentlicht in:	ECS transactions 2006-07, Vol.1 (10), p.79-91
Hauptverfasser:	Yang, Sang Ryol, Kim, Jin-Gyun, Noh, Jin-Tae, Kim, Hong-Suk, Lee, Sung-Hae, Ahn, Jae-Young, Hwang, Ki-Hyun, Shin, Yu-Gyun, Chung, Uin, Moon, Jootae, Lee, Dong-Kak, Yi, In-Sun, Jung, Ran-Ju, Kang, Sang-Bum
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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