Measuring the thickness of oxide on polysilicon using ultraviolet ellipsometry

Measuring the thickness of oxide on polysilicon using ultraviolet ellipsometry

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Veröffentlicht in:Journal of the Electrochemical Society 1992-06, Vol.139 (6), p.1772-1777
Hauptverfasser: TOMPKINS, H. G, VASQUEZ, B, MATHIS, T, YETTER, G
Format: Artikel
Sprache:eng
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Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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container_end_page 1777
container_issue 6
container_start_page 1772
container_title Journal of the Electrochemical Society
container_volume 139
creator TOMPKINS, H. G
VASQUEZ, B
MATHIS, T
YETTER, G
description
doi_str_mv 10.1149/1.2069492
format Article
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source IOP Publishing Journals
subjects Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
title Measuring the thickness of oxide on polysilicon using ultraviolet ellipsometry
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