Paramagnetic Point Defects in Amorphous Silicon Dioxide and Amorphous Silicon Nitride Thin Films: II

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Veröffentlicht in:	Journal of the Electrochemical Society 1992-03, Vol.139 (3), p.880-889
Hauptverfasser:	Warren, W. L., Kanicki, J., Rong, F. C., Poindexter, E. H.
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Sprache:	eng ; jpn
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title	Paramagnetic Point Defects in Amorphous Silicon Dioxide and Amorphous Silicon Nitride Thin Films: II
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