Behavior of Cu(P) and oxygen free high conductivity Cu anodes under electrodeposition conditions
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Veröffentlicht in: | Journal of the Electrochemical Society 1993-04, Vol.140 (4), p.959-965 |
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container_issue | 4 |
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container_title | Journal of the Electrochemical Society |
container_volume | 140 |
creator | FRANKEL, G. S SCHROTT, A. G ISAACS, H. S HORKANS, J ANDRICACOS, P. C |
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doi_str_mv | 10.1149/1.2056235 |
format | Article |
fullrecord | <record><control><sourceid>pascalfrancis_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1149_1_2056235</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>4696266</sourcerecordid><originalsourceid>FETCH-LOGICAL-c291t-c9d9eb4b966aad14a04cd98324c5f0c1454b70b69f9f33ba09fbd7d12677625c3</originalsourceid><addsrcrecordid>eNo90LtOwzAUBmALgUQpDLyBBwY6pPj4lnqEqlykSjDAHBxfGqMQV3Za0bcntBXTueg7Z_gRugYyBeDqDqaUCEmZOEEjUFwUJQCcohEhwAouBZyji5y_hhFmvByhzwfX6G2ICUeP55vbtwnWncXxZ7dyHfbJOdyEVYNN7OzG9GEb-t3gBhSty3jTWZewa53p07BYxxz6ELs933f5Ep153WZ3daxj9PG4eJ8_F8vXp5f5_bIwVEFfGGWVq3mtpNTaAteEG6tmjHIjPDHABa9LUkvllWes1kT52pYWqCxLSYVhYzQ5_DUp5pycr9YpfOu0q4BUf9FUUB2jGezNwa51Nrr1SXcm5P8DLpWkUrJf8XljfQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Behavior of Cu(P) and oxygen free high conductivity Cu anodes under electrodeposition conditions</title><source>IOP Publishing Journals</source><creator>FRANKEL, G. S ; SCHROTT, A. G ; ISAACS, H. S ; HORKANS, J ; ANDRICACOS, P. C</creator><creatorcontrib>FRANKEL, G. S ; SCHROTT, A. G ; ISAACS, H. S ; HORKANS, J ; ANDRICACOS, P. C</creatorcontrib><identifier>ISSN: 0013-4651</identifier><identifier>EISSN: 1945-7111</identifier><identifier>DOI: 10.1149/1.2056235</identifier><identifier>CODEN: JESOAN</identifier><language>eng</language><publisher>Pennington, NJ: Electrochemical Society</publisher><subject>Chemistry ; Electrochemistry ; Electrodeposition ; Exact sciences and technology ; General and physical chemistry ; Study of interfaces</subject><ispartof>Journal of the Electrochemical Society, 1993-04, Vol.140 (4), p.959-965</ispartof><rights>1993 INIST-CNRS</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c291t-c9d9eb4b966aad14a04cd98324c5f0c1454b70b69f9f33ba09fbd7d12677625c3</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27903,27904</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=4696266$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>FRANKEL, G. S</creatorcontrib><creatorcontrib>SCHROTT, A. G</creatorcontrib><creatorcontrib>ISAACS, H. S</creatorcontrib><creatorcontrib>HORKANS, J</creatorcontrib><creatorcontrib>ANDRICACOS, P. C</creatorcontrib><title>Behavior of Cu(P) and oxygen free high conductivity Cu anodes under electrodeposition conditions</title><title>Journal of the Electrochemical Society</title><subject>Chemistry</subject><subject>Electrochemistry</subject><subject>Electrodeposition</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>Study of interfaces</subject><issn>0013-4651</issn><issn>1945-7111</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1993</creationdate><recordtype>article</recordtype><recordid>eNo90LtOwzAUBmALgUQpDLyBBwY6pPj4lnqEqlykSjDAHBxfGqMQV3Za0bcntBXTueg7Z_gRugYyBeDqDqaUCEmZOEEjUFwUJQCcohEhwAouBZyji5y_hhFmvByhzwfX6G2ICUeP55vbtwnWncXxZ7dyHfbJOdyEVYNN7OzG9GEb-t3gBhSty3jTWZewa53p07BYxxz6ELs933f5Ep153WZ3daxj9PG4eJ8_F8vXp5f5_bIwVEFfGGWVq3mtpNTaAteEG6tmjHIjPDHABa9LUkvllWes1kT52pYWqCxLSYVhYzQ5_DUp5pycr9YpfOu0q4BUf9FUUB2jGezNwa51Nrr1SXcm5P8DLpWkUrJf8XljfQ</recordid><startdate>19930401</startdate><enddate>19930401</enddate><creator>FRANKEL, G. S</creator><creator>SCHROTT, A. G</creator><creator>ISAACS, H. S</creator><creator>HORKANS, J</creator><creator>ANDRICACOS, P. C</creator><general>Electrochemical Society</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19930401</creationdate><title>Behavior of Cu(P) and oxygen free high conductivity Cu anodes under electrodeposition conditions</title><author>FRANKEL, G. S ; SCHROTT, A. G ; ISAACS, H. S ; HORKANS, J ; ANDRICACOS, P. C</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c291t-c9d9eb4b966aad14a04cd98324c5f0c1454b70b69f9f33ba09fbd7d12677625c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1993</creationdate><topic>Chemistry</topic><topic>Electrochemistry</topic><topic>Electrodeposition</topic><topic>Exact sciences and technology</topic><topic>General and physical chemistry</topic><topic>Study of interfaces</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>FRANKEL, G. S</creatorcontrib><creatorcontrib>SCHROTT, A. G</creatorcontrib><creatorcontrib>ISAACS, H. S</creatorcontrib><creatorcontrib>HORKANS, J</creatorcontrib><creatorcontrib>ANDRICACOS, P. C</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Journal of the Electrochemical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>FRANKEL, G. S</au><au>SCHROTT, A. G</au><au>ISAACS, H. S</au><au>HORKANS, J</au><au>ANDRICACOS, P. C</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Behavior of Cu(P) and oxygen free high conductivity Cu anodes under electrodeposition conditions</atitle><jtitle>Journal of the Electrochemical Society</jtitle><date>1993-04-01</date><risdate>1993</risdate><volume>140</volume><issue>4</issue><spage>959</spage><epage>965</epage><pages>959-965</pages><issn>0013-4651</issn><eissn>1945-7111</eissn><coden>JESOAN</coden><cop>Pennington, NJ</cop><pub>Electrochemical Society</pub><doi>10.1149/1.2056235</doi><tpages>7</tpages><oa>free_for_read</oa></addata></record> |
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identifier | ISSN: 0013-4651 |
ispartof | Journal of the Electrochemical Society, 1993-04, Vol.140 (4), p.959-965 |
issn | 0013-4651 1945-7111 |
language | eng |
recordid | cdi_crossref_primary_10_1149_1_2056235 |
source | IOP Publishing Journals |
subjects | Chemistry Electrochemistry Electrodeposition Exact sciences and technology General and physical chemistry Study of interfaces |
title | Behavior of Cu(P) and oxygen free high conductivity Cu anodes under electrodeposition conditions |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T08%3A07%3A28IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Behavior%20of%20Cu(P)%20and%20oxygen%20free%20high%20conductivity%20Cu%20anodes%20under%20electrodeposition%20conditions&rft.jtitle=Journal%20of%20the%20Electrochemical%20Society&rft.au=FRANKEL,%20G.%20S&rft.date=1993-04-01&rft.volume=140&rft.issue=4&rft.spage=959&rft.epage=965&rft.pages=959-965&rft.issn=0013-4651&rft.eissn=1945-7111&rft.coden=JESOAN&rft_id=info:doi/10.1149/1.2056235&rft_dat=%3Cpascalfrancis_cross%3E4696266%3C/pascalfrancis_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |