Atomic Layer Deposition and Characterization of HfO[sub 2] Films on Noble Metal Film Substrates

Atomic Layer Deposition and Characterization of HfO[sub 2] Films on Noble Metal Film Substrates

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Veröffentlicht in:Journal of the Electrochemical Society 2005, Vol.152 (7), p.F75
Hauptverfasser: Kukli, Kaupo, Aaltonen, Titta, Aarik, Jaan, Lu, Jun, Ritala, Mikko, Ferrari, Sandro, Hårsta, Anders, Leskelä, Markku
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container_title Journal of the Electrochemical Society
container_volume 152
creator Kukli, Kaupo
Aaltonen, Titta
Aarik, Jaan
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Ritala, Mikko
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Hårsta, Anders
Leskelä, Markku
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title Atomic Layer Deposition and Characterization of HfO[sub 2] Films on Noble Metal Film Substrates
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