Optimization of the growth of CdTe thin films formed by electrochemical atomic layer epitaxy in an automated deposition system
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| Veröffentlicht in: | Journal of the Electrochemical Society 1998-10, Vol.145 (10), p.3594-3602 |
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| container_end_page | 3602 |
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| container_issue | 10 |
| container_start_page | 3594 |
| container_title | Journal of the Electrochemical Society |
| container_volume | 145 |
| creator | COLLETTI, L. P STICKNEY, J. L |
| description | |
| doi_str_mv | 10.1149/1.1838848 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0013-4651 |
| ispartof | Journal of the Electrochemical Society, 1998-10, Vol.145 (10), p.3594-3602 |
| issn | 0013-4651 1945-7111 |
| language | eng |
| recordid | cdi_crossref_primary_10_1149_1_1838848 |
| source | IOP Publishing Journals |
| subjects | Cross-disciplinary physics: materials science rheology Electrodeposition, electroplating Exact sciences and technology Liquid phase epitaxy deposition from liquid phases (melts, solutions, and surface layers on liquids) Materials science Methods of deposition of films and coatings film growth and epitaxy Physics |
| title | Optimization of the growth of CdTe thin films formed by electrochemical atomic layer epitaxy in an automated deposition system |
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