Improved porous mixture of molybdenum nitride and tantalum oxide as a charge storage material
High surface area {gamma}-molybdenum nitride has shown promise as a charge storage material. The addition of amorphous tantalum oxide to the molybdenum nitride system not only improves the film cohesion tremendously, but also widens the voltage stability window from 0.8 to 1.1 V. This occurs without...
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Veröffentlicht in: | Journal of the Electrochemical Society 1998-04, Vol.145 (4), p.L61-L63 |
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Sprache: | eng |
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