Electrolyzed Sulfuric Acid Application in Semiconductor Cleaning Processes: An Advanced Substitution of SPM Cleaning

For SPM(Sulfuric acid Peroxide Mixture) cleaning, a widely used method in semiconductor process, the density of peroxide is the main factor for metal and polymer removal. As the technology node shrinks, the need for both better polymer removal performance and less for metal removal is required. Howe...

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Veröffentlicht in:	ECS transactions 2017-04, Vol.77 (5), p.207-212
Hauptverfasser:	Ahn, Jin-hyun, Kim, Pyung Dae, Hwang, Seong Cheol, Seo, Jinyoung, Lee, Sungjin, Ogawa, Yuichi, Ida, Junichi, Sasaki, Yuya, Nagai, Tatsuo, Otsu, Toru
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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