Development of Interatomic Potential of Group IV Alloy Semiconductors for Lattice Dynamics Simulation
We have newly developed the interatomic potential of Si, Ge or Ge, Sn mixed systems to reproduce the lattice constant, phonon frequency, and phonon dispersion relations in the bulk pure group IV crystal and group IV alloys by molecular dynamics (MD) simulation. The phonon dispersion relation is deri...
Gespeichert in:
Veröffentlicht in: | ECS transactions 2016-08, Vol.75 (8), p.785-794 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 794 |
---|---|
container_issue | 8 |
container_start_page | 785 |
container_title | ECS transactions |
container_volume | 75 |
creator | Tomita, Motohiro Ogura, Atsushi Watanabe, Takanobu |
description | We have newly developed the interatomic potential of Si, Ge or Ge, Sn mixed systems to reproduce the lattice constant, phonon frequency, and phonon dispersion relations in the bulk pure group IV crystal and group IV alloys by molecular dynamics (MD) simulation. The phonon dispersion relation is derived from the dynamical structure factor which is calculated by the space-time Fourier transform of atomic trajectories in MD simulation. The newly designed potential parameter set reproduces the experimental data of lattice constant and phonon frequency in Si, Ge, Sn, and SiGe. Furthermore, the Sn concentration dependence of the phonon frequency, which are not yet clarified, is calculated with three type assumptions of lattice constant in GeSn alloy. This work enables us to predict the elastic and phonon related properties of bulk group IV alloys. |
doi_str_mv | 10.1149/07508.0785ecst |
format | Article |
fullrecord | <record><control><sourceid>iop_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1149_07508_0785ecst</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10.1149/07508.0785ecst</sourcerecordid><originalsourceid>FETCH-LOGICAL-c340t-d1af7f12a0dcfb502b7e9c536ef8633ee5f3e9c27b17441f3d0064236cd459753</originalsourceid><addsrcrecordid>eNp1UM9LwzAUDqLgnF495yx0Jk3TtMex6RwMFKZeS5q-QEbblCQV-t-b_fDo6T2-H4_vfQg9UrKgNCufieCkWBBRcFA-XKEZLVmR5IKJ68vOizy9RXfeHwjJo0fMEKzhB1o7dNAHbDXe9gGcDLYzCn_YEFEj2yOxcXYc8PYbL9vWTngPUWH7ZlTBOo-1dXgnQzAK8HrqZSQ93ptubGUwtr9HN1q2Hh4uc46-Xl8-V2_J7n2zXS13iWIZCUlDpRaappI0StecpLWAUnGWgy5yxgC4ZhFIRU1FllHNmvhHlrJcNRkvBWdztDjfVc5670BXgzOddFNFSXUsqTqVVP2VFA1PZ4OxQ3Wwo-tjvP_Ev8w2agw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Development of Interatomic Potential of Group IV Alloy Semiconductors for Lattice Dynamics Simulation</title><source>Institute of Physics Journals</source><creator>Tomita, Motohiro ; Ogura, Atsushi ; Watanabe, Takanobu</creator><creatorcontrib>Tomita, Motohiro ; Ogura, Atsushi ; Watanabe, Takanobu</creatorcontrib><description>We have newly developed the interatomic potential of Si, Ge or Ge, Sn mixed systems to reproduce the lattice constant, phonon frequency, and phonon dispersion relations in the bulk pure group IV crystal and group IV alloys by molecular dynamics (MD) simulation. The phonon dispersion relation is derived from the dynamical structure factor which is calculated by the space-time Fourier transform of atomic trajectories in MD simulation. The newly designed potential parameter set reproduces the experimental data of lattice constant and phonon frequency in Si, Ge, Sn, and SiGe. Furthermore, the Sn concentration dependence of the phonon frequency, which are not yet clarified, is calculated with three type assumptions of lattice constant in GeSn alloy. This work enables us to predict the elastic and phonon related properties of bulk group IV alloys.</description><identifier>ISSN: 1938-5862</identifier><identifier>EISSN: 1938-6737</identifier><identifier>DOI: 10.1149/07508.0785ecst</identifier><language>eng</language><publisher>The Electrochemical Society, Inc</publisher><ispartof>ECS transactions, 2016-08, Vol.75 (8), p.785-794</ispartof><rights>2016 ECS - The Electrochemical Society</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c340t-d1af7f12a0dcfb502b7e9c536ef8633ee5f3e9c27b17441f3d0064236cd459753</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1149/07508.0785ecst/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,780,784,27924,27925,53846,53893</link.rule.ids></links><search><creatorcontrib>Tomita, Motohiro</creatorcontrib><creatorcontrib>Ogura, Atsushi</creatorcontrib><creatorcontrib>Watanabe, Takanobu</creatorcontrib><title>Development of Interatomic Potential of Group IV Alloy Semiconductors for Lattice Dynamics Simulation</title><title>ECS transactions</title><addtitle>ECS Trans</addtitle><description>We have newly developed the interatomic potential of Si, Ge or Ge, Sn mixed systems to reproduce the lattice constant, phonon frequency, and phonon dispersion relations in the bulk pure group IV crystal and group IV alloys by molecular dynamics (MD) simulation. The phonon dispersion relation is derived from the dynamical structure factor which is calculated by the space-time Fourier transform of atomic trajectories in MD simulation. The newly designed potential parameter set reproduces the experimental data of lattice constant and phonon frequency in Si, Ge, Sn, and SiGe. Furthermore, the Sn concentration dependence of the phonon frequency, which are not yet clarified, is calculated with three type assumptions of lattice constant in GeSn alloy. This work enables us to predict the elastic and phonon related properties of bulk group IV alloys.</description><issn>1938-5862</issn><issn>1938-6737</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><recordid>eNp1UM9LwzAUDqLgnF495yx0Jk3TtMex6RwMFKZeS5q-QEbblCQV-t-b_fDo6T2-H4_vfQg9UrKgNCufieCkWBBRcFA-XKEZLVmR5IKJ68vOizy9RXfeHwjJo0fMEKzhB1o7dNAHbDXe9gGcDLYzCn_YEFEj2yOxcXYc8PYbL9vWTngPUWH7ZlTBOo-1dXgnQzAK8HrqZSQ93ptubGUwtr9HN1q2Hh4uc46-Xl8-V2_J7n2zXS13iWIZCUlDpRaappI0StecpLWAUnGWgy5yxgC4ZhFIRU1FllHNmvhHlrJcNRkvBWdztDjfVc5670BXgzOddFNFSXUsqTqVVP2VFA1PZ4OxQ3Wwo-tjvP_Ev8w2agw</recordid><startdate>20160818</startdate><enddate>20160818</enddate><creator>Tomita, Motohiro</creator><creator>Ogura, Atsushi</creator><creator>Watanabe, Takanobu</creator><general>The Electrochemical Society, Inc</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20160818</creationdate><title>Development of Interatomic Potential of Group IV Alloy Semiconductors for Lattice Dynamics Simulation</title><author>Tomita, Motohiro ; Ogura, Atsushi ; Watanabe, Takanobu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c340t-d1af7f12a0dcfb502b7e9c536ef8633ee5f3e9c27b17441f3d0064236cd459753</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Tomita, Motohiro</creatorcontrib><creatorcontrib>Ogura, Atsushi</creatorcontrib><creatorcontrib>Watanabe, Takanobu</creatorcontrib><collection>CrossRef</collection><jtitle>ECS transactions</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Tomita, Motohiro</au><au>Ogura, Atsushi</au><au>Watanabe, Takanobu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Development of Interatomic Potential of Group IV Alloy Semiconductors for Lattice Dynamics Simulation</atitle><jtitle>ECS transactions</jtitle><addtitle>ECS Trans</addtitle><date>2016-08-18</date><risdate>2016</risdate><volume>75</volume><issue>8</issue><spage>785</spage><epage>794</epage><pages>785-794</pages><issn>1938-5862</issn><eissn>1938-6737</eissn><abstract>We have newly developed the interatomic potential of Si, Ge or Ge, Sn mixed systems to reproduce the lattice constant, phonon frequency, and phonon dispersion relations in the bulk pure group IV crystal and group IV alloys by molecular dynamics (MD) simulation. The phonon dispersion relation is derived from the dynamical structure factor which is calculated by the space-time Fourier transform of atomic trajectories in MD simulation. The newly designed potential parameter set reproduces the experimental data of lattice constant and phonon frequency in Si, Ge, Sn, and SiGe. Furthermore, the Sn concentration dependence of the phonon frequency, which are not yet clarified, is calculated with three type assumptions of lattice constant in GeSn alloy. This work enables us to predict the elastic and phonon related properties of bulk group IV alloys.</abstract><pub>The Electrochemical Society, Inc</pub><doi>10.1149/07508.0785ecst</doi><tpages>10</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1938-5862 |
ispartof | ECS transactions, 2016-08, Vol.75 (8), p.785-794 |
issn | 1938-5862 1938-6737 |
language | eng |
recordid | cdi_crossref_primary_10_1149_07508_0785ecst |
source | Institute of Physics Journals |
title | Development of Interatomic Potential of Group IV Alloy Semiconductors for Lattice Dynamics Simulation |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-02T08%3A27%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-iop_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Development%20of%20Interatomic%20Potential%20of%20Group%20IV%20Alloy%20Semiconductors%20for%20Lattice%20Dynamics%20Simulation&rft.jtitle=ECS%20transactions&rft.au=Tomita,%20Motohiro&rft.date=2016-08-18&rft.volume=75&rft.issue=8&rft.spage=785&rft.epage=794&rft.pages=785-794&rft.issn=1938-5862&rft.eissn=1938-6737&rft_id=info:doi/10.1149/07508.0785ecst&rft_dat=%3Ciop_cross%3E10.1149/07508.0785ecst%3C/iop_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |