Hermeticity and Reliability of Al-Al Thermocompression Wafer Bonding

Hermeticity and reliability of laminates bonded by Al-Al thermocompression bonding applying different bonding parameters have been investigated. Laminates of diameter 150 mm were realized by bonding a wafer containing membrane structures to wafers with patterned bonding frames. The laminates were bo...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Malik, Nisant, Poppe, Erik, Schjolberg-Henriksen, Kari, Taklo, Maaike Margrete Visser, Finstad, Terje G
Format: Tagungsbericht
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 160
container_issue 5
container_start_page 149
container_title
container_volume 64
creator Malik, Nisant
Poppe, Erik
Schjolberg-Henriksen, Kari
Taklo, Maaike Margrete Visser
Finstad, Terje G
description Hermeticity and reliability of laminates bonded by Al-Al thermocompression bonding applying different bonding parameters have been investigated. Laminates of diameter 150 mm were realized by bonding a wafer containing membrane structures to wafers with patterned bonding frames. The laminates were bonded applying a bond force of 36 or 60 kN at temperatures ranging from 300 to 400 °C for 15, 30 or 60 minutes. The hermetic properties were estimated by optical measurement of membrane deflection after bonding. Reliability was tested by exposing the laminates to a steady-state life test, a thermal shock test, and a moisture resistance test. Laminates bonded applying a bond force of 60 kN at temperatures of 350 °C or higher resulted in hermetic and reliable bonds. All the dies on the laminates survived steady-state life test and thermal shock test. Leakage was observed in some dies after exposure to moisture resistance test. Measurements of membrane deflection estimated a maximum leak rate below 10-11 mbar×l×s-1 for all tested bonding parameters.
doi_str_mv 10.1149/06405.0149ecst
format Conference Proceeding
fullrecord <record><control><sourceid>iop_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1149_06405_0149ecst</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10.1149/06405.0149ecst</sourcerecordid><originalsourceid>FETCH-LOGICAL-c274t-dccfbe447e471fd23847dd4cf34d9e7d2f8150e954cf2ed171ffcbb5681bc2683</originalsourceid><addsrcrecordid>eNp1kMFLwzAUxoMoOKdXzzkLrUmaJu2xTueEgSATj6FNXjSjbUZSD_vvzdw8enrfe3zf4-OH0C0lOaW8vieCkzInSYKO0xma0bqoMiELeX7SZSXYJbqKcUuISBk5Q48rCANMTrtpj9vR4DfoXdu5_rB7i5s-a3q8-Uour_2wCxCj8yP-aC0E_OBH48bPa3Rh2z7CzWnO0fvyabNYZevX55dFs840k3zKjNa2A84lcEmtYUXFpTFc24KbGqRhtqIlgbpMJwaGJpPVXVeKinaaiaqYo_z4VwcfYwCrdsENbdgrStSBgfploP4YpMDdMeD8Tm39dxhTvf_MP7S4XlQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Hermeticity and Reliability of Al-Al Thermocompression Wafer Bonding</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Malik, Nisant ; Poppe, Erik ; Schjolberg-Henriksen, Kari ; Taklo, Maaike Margrete Visser ; Finstad, Terje G</creator><creatorcontrib>Malik, Nisant ; Poppe, Erik ; Schjolberg-Henriksen, Kari ; Taklo, Maaike Margrete Visser ; Finstad, Terje G</creatorcontrib><description>Hermeticity and reliability of laminates bonded by Al-Al thermocompression bonding applying different bonding parameters have been investigated. Laminates of diameter 150 mm were realized by bonding a wafer containing membrane structures to wafers with patterned bonding frames. The laminates were bonded applying a bond force of 36 or 60 kN at temperatures ranging from 300 to 400 °C for 15, 30 or 60 minutes. The hermetic properties were estimated by optical measurement of membrane deflection after bonding. Reliability was tested by exposing the laminates to a steady-state life test, a thermal shock test, and a moisture resistance test. Laminates bonded applying a bond force of 60 kN at temperatures of 350 °C or higher resulted in hermetic and reliable bonds. All the dies on the laminates survived steady-state life test and thermal shock test. Leakage was observed in some dies after exposure to moisture resistance test. Measurements of membrane deflection estimated a maximum leak rate below 10-11 mbar×l×s-1 for all tested bonding parameters.</description><identifier>ISSN: 1938-5862</identifier><identifier>EISSN: 1938-6737</identifier><identifier>DOI: 10.1149/06405.0149ecst</identifier><language>eng</language><publisher>The Electrochemical Society, Inc</publisher><ispartof>ECS transactions, 2014, Vol.64 (5), p.149-160</ispartof><rights>2014 ECS - The Electrochemical Society</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c274t-dccfbe447e471fd23847dd4cf34d9e7d2f8150e954cf2ed171ffcbb5681bc2683</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1149/06405.0149ecst/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,780,784,27923,27924,53845,53892</link.rule.ids></links><search><creatorcontrib>Malik, Nisant</creatorcontrib><creatorcontrib>Poppe, Erik</creatorcontrib><creatorcontrib>Schjolberg-Henriksen, Kari</creatorcontrib><creatorcontrib>Taklo, Maaike Margrete Visser</creatorcontrib><creatorcontrib>Finstad, Terje G</creatorcontrib><title>Hermeticity and Reliability of Al-Al Thermocompression Wafer Bonding</title><title>ECS transactions</title><addtitle>ECS Trans</addtitle><description>Hermeticity and reliability of laminates bonded by Al-Al thermocompression bonding applying different bonding parameters have been investigated. Laminates of diameter 150 mm were realized by bonding a wafer containing membrane structures to wafers with patterned bonding frames. The laminates were bonded applying a bond force of 36 or 60 kN at temperatures ranging from 300 to 400 °C for 15, 30 or 60 minutes. The hermetic properties were estimated by optical measurement of membrane deflection after bonding. Reliability was tested by exposing the laminates to a steady-state life test, a thermal shock test, and a moisture resistance test. Laminates bonded applying a bond force of 60 kN at temperatures of 350 °C or higher resulted in hermetic and reliable bonds. All the dies on the laminates survived steady-state life test and thermal shock test. Leakage was observed in some dies after exposure to moisture resistance test. Measurements of membrane deflection estimated a maximum leak rate below 10-11 mbar×l×s-1 for all tested bonding parameters.</description><issn>1938-5862</issn><issn>1938-6737</issn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2014</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNp1kMFLwzAUxoMoOKdXzzkLrUmaJu2xTueEgSATj6FNXjSjbUZSD_vvzdw8enrfe3zf4-OH0C0lOaW8vieCkzInSYKO0xma0bqoMiELeX7SZSXYJbqKcUuISBk5Q48rCANMTrtpj9vR4DfoXdu5_rB7i5s-a3q8-Uour_2wCxCj8yP-aC0E_OBH48bPa3Rh2z7CzWnO0fvyabNYZevX55dFs840k3zKjNa2A84lcEmtYUXFpTFc24KbGqRhtqIlgbpMJwaGJpPVXVeKinaaiaqYo_z4VwcfYwCrdsENbdgrStSBgfploP4YpMDdMeD8Tm39dxhTvf_MP7S4XlQ</recordid><startdate>20140814</startdate><enddate>20140814</enddate><creator>Malik, Nisant</creator><creator>Poppe, Erik</creator><creator>Schjolberg-Henriksen, Kari</creator><creator>Taklo, Maaike Margrete Visser</creator><creator>Finstad, Terje G</creator><general>The Electrochemical Society, Inc</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20140814</creationdate><title>Hermeticity and Reliability of Al-Al Thermocompression Wafer Bonding</title><author>Malik, Nisant ; Poppe, Erik ; Schjolberg-Henriksen, Kari ; Taklo, Maaike Margrete Visser ; Finstad, Terje G</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c274t-dccfbe447e471fd23847dd4cf34d9e7d2f8150e954cf2ed171ffcbb5681bc2683</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2014</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Malik, Nisant</creatorcontrib><creatorcontrib>Poppe, Erik</creatorcontrib><creatorcontrib>Schjolberg-Henriksen, Kari</creatorcontrib><creatorcontrib>Taklo, Maaike Margrete Visser</creatorcontrib><creatorcontrib>Finstad, Terje G</creatorcontrib><collection>CrossRef</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Malik, Nisant</au><au>Poppe, Erik</au><au>Schjolberg-Henriksen, Kari</au><au>Taklo, Maaike Margrete Visser</au><au>Finstad, Terje G</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Hermeticity and Reliability of Al-Al Thermocompression Wafer Bonding</atitle><btitle>ECS transactions</btitle><addtitle>ECS Trans</addtitle><date>2014-08-14</date><risdate>2014</risdate><volume>64</volume><issue>5</issue><spage>149</spage><epage>160</epage><pages>149-160</pages><issn>1938-5862</issn><eissn>1938-6737</eissn><abstract>Hermeticity and reliability of laminates bonded by Al-Al thermocompression bonding applying different bonding parameters have been investigated. Laminates of diameter 150 mm were realized by bonding a wafer containing membrane structures to wafers with patterned bonding frames. The laminates were bonded applying a bond force of 36 or 60 kN at temperatures ranging from 300 to 400 °C for 15, 30 or 60 minutes. The hermetic properties were estimated by optical measurement of membrane deflection after bonding. Reliability was tested by exposing the laminates to a steady-state life test, a thermal shock test, and a moisture resistance test. Laminates bonded applying a bond force of 60 kN at temperatures of 350 °C or higher resulted in hermetic and reliable bonds. All the dies on the laminates survived steady-state life test and thermal shock test. Leakage was observed in some dies after exposure to moisture resistance test. Measurements of membrane deflection estimated a maximum leak rate below 10-11 mbar×l×s-1 for all tested bonding parameters.</abstract><pub>The Electrochemical Society, Inc</pub><doi>10.1149/06405.0149ecst</doi><tpages>12</tpages></addata></record>
fulltext fulltext
identifier ISSN: 1938-5862
ispartof ECS transactions, 2014, Vol.64 (5), p.149-160
issn 1938-5862
1938-6737
language eng
recordid cdi_crossref_primary_10_1149_06405_0149ecst
source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title Hermeticity and Reliability of Al-Al Thermocompression Wafer Bonding
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-12T13%3A04%3A00IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-iop_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Hermeticity%20and%20Reliability%20of%20Al-Al%20Thermocompression%20Wafer%20Bonding&rft.btitle=ECS%20transactions&rft.au=Malik,%20Nisant&rft.date=2014-08-14&rft.volume=64&rft.issue=5&rft.spage=149&rft.epage=160&rft.pages=149-160&rft.issn=1938-5862&rft.eissn=1938-6737&rft_id=info:doi/10.1149/06405.0149ecst&rft_dat=%3Ciop_cross%3E10.1149/06405.0149ecst%3C/iop_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true