Rapid Reversible Degradation of Silicon Thin Films by a Treatment in Water

Metastability effects in amorphous and microcrystalline silicon thin films induced by exposure to atmospheric gases and water are investigated. A simple procedure is described which allows studying such effects in a reproducible and reliable manner on a short time scale. The method is applied to thi...

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Veröffentlicht in:	Japanese Journal of Applied Physics 2012-07, Vol.51 (7), p.070210-070210-3
Hauptverfasser:	Turan, Elif, Yilmaz, Gokhan, Smirnov, Vladimir, Finger, Friedhelm, Günes, Mehmet
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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