Oxidation Resistance of Ti--Si--N and Ti--Al--Si--N Films Deposited by Reactive Sputtering Using Alloy Targets

Ti--Si--N and Ti--Al--Si--N films, which possess high hardness due to the formation of a nanocomposite structure in the films, were deposited by reactive magnetron sputtering using alloy targets and then postannealed in air at temperatures ranging from 300 to 800 °C. The hardness of both the films d...

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Veröffentlicht in:	Japanese Journal of Applied Physics 2011-07, Vol.50 (7), p.075802-075802-5
Hauptverfasser:	Takahashi, Kousuke, Oka, Nobuto, Yamaguchi, Maho, Seino, Yutaka, Hattori, Koichiro, Nakamura, Shin-ichi, Sato, Yasushi, Shigesato, Yuzo
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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