Optical and Electrical Properties of Tin-Doped Cadmium Oxide Films Prepared by Electron Beam Technique

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Japanese Journal of Applied Physics 2009-04, Vol.48 (4R), p.41101
Hauptverfasser:	Ali, H. M., Mohamed, H. A., Wakkad, M. M., Hasaneen, M. F.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page
container_issue	4R
container_start_page	41101
container_title	Japanese Journal of Applied Physics
container_volume	48
creator	Ali, H. M. Mohamed, H. A. Wakkad, M. M. Hasaneen, M. F.
description
doi_str_mv	10.1143/JJAP.48.041101
format	Article
fullrecord	<record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1143_JJAP_48_041101</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1143_JJAP_48_041101</sourcerecordid><originalsourceid>FETCH-LOGICAL-c331t-efeea2852ca9c5067a64e7f7cda3e58ed387094ec1f949b89238c5e597074e623</originalsourceid><addsrcrecordid>eNotkMtOAjEYhRujiYhuXfcFZux12i4RASUksMD1pHT-xpq52Q6JvL2DsDo5l5zFh9AzJTmlgr-s17NdLnROBKWE3qAJ5UJlghTyFk0IYTQThrF79JDS92gLKegE-W0_BGdrbNsKL2pwQ_y3u9j1EIcACXce70ObvY1Bhee2asKxwdvfUAFehrpJ4xZ6G8fycLpedC1-BdvgPbivNvwc4RHdeVsneLrqFH0uF_v5e7bZrj7ms03mOKdDBh7AMi2Zs8ZJUihbCFBeucpykBoqrhUxAhz1RpiDNoxrJ0EaRZSAgvEpyi-_LnYpRfBlH0Nj46mkpDxTKs-USqHLCyX-B_lnWuA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Optical and Electrical Properties of Tin-Doped Cadmium Oxide Films Prepared by Electron Beam Technique</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Ali, H. M. ; Mohamed, H. A. ; Wakkad, M. M. ; Hasaneen, M. F.</creator><creatorcontrib>Ali, H. M. ; Mohamed, H. A. ; Wakkad, M. M. ; Hasaneen, M. F.</creatorcontrib><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/JJAP.48.041101</identifier><language>eng</language><ispartof>Japanese Journal of Applied Physics, 2009-04, Vol.48 (4R), p.41101</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c331t-efeea2852ca9c5067a64e7f7cda3e58ed387094ec1f949b89238c5e597074e623</citedby><cites>FETCH-LOGICAL-c331t-efeea2852ca9c5067a64e7f7cda3e58ed387094ec1f949b89238c5e597074e623</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27922,27923</link.rule.ids></links><search><creatorcontrib>Ali, H. M.</creatorcontrib><creatorcontrib>Mohamed, H. A.</creatorcontrib><creatorcontrib>Wakkad, M. M.</creatorcontrib><creatorcontrib>Hasaneen, M. F.</creatorcontrib><title>Optical and Electrical Properties of Tin-Doped Cadmium Oxide Films Prepared by Electron Beam Technique</title><title>Japanese Journal of Applied Physics</title><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNotkMtOAjEYhRujiYhuXfcFZux12i4RASUksMD1pHT-xpq52Q6JvL2DsDo5l5zFh9AzJTmlgr-s17NdLnROBKWE3qAJ5UJlghTyFk0IYTQThrF79JDS92gLKegE-W0_BGdrbNsKL2pwQ_y3u9j1EIcACXce70ObvY1Bhee2asKxwdvfUAFehrpJ4xZ6G8fycLpedC1-BdvgPbivNvwc4RHdeVsneLrqFH0uF_v5e7bZrj7ms03mOKdDBh7AMi2Zs8ZJUihbCFBeucpykBoqrhUxAhz1RpiDNoxrJ0EaRZSAgvEpyi-_LnYpRfBlH0Nj46mkpDxTKs-USqHLCyX-B_lnWuA</recordid><startdate>20090401</startdate><enddate>20090401</enddate><creator>Ali, H. M.</creator><creator>Mohamed, H. A.</creator><creator>Wakkad, M. M.</creator><creator>Hasaneen, M. F.</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20090401</creationdate><title>Optical and Electrical Properties of Tin-Doped Cadmium Oxide Films Prepared by Electron Beam Technique</title><author>Ali, H. M. ; Mohamed, H. A. ; Wakkad, M. M. ; Hasaneen, M. F.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c331t-efeea2852ca9c5067a64e7f7cda3e58ed387094ec1f949b89238c5e597074e623</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ali, H. M.</creatorcontrib><creatorcontrib>Mohamed, H. A.</creatorcontrib><creatorcontrib>Wakkad, M. M.</creatorcontrib><creatorcontrib>Hasaneen, M. F.</creatorcontrib><collection>CrossRef</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ali, H. M.</au><au>Mohamed, H. A.</au><au>Wakkad, M. M.</au><au>Hasaneen, M. F.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Optical and Electrical Properties of Tin-Doped Cadmium Oxide Films Prepared by Electron Beam Technique</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2009-04-01</date><risdate>2009</risdate><volume>48</volume><issue>4R</issue><spage>41101</spage><pages>41101-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><doi>10.1143/JJAP.48.041101</doi></addata></record>
fulltext	fulltext
identifier	ISSN: 0021-4922
ispartof	Japanese Journal of Applied Physics, 2009-04, Vol.48 (4R), p.41101
issn	0021-4922 1347-4065
language	eng
recordid	cdi_crossref_primary_10_1143_JJAP_48_041101
source	IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title	Optical and Electrical Properties of Tin-Doped Cadmium Oxide Films Prepared by Electron Beam Technique
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-13T11%3A43%3A21IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Optical%20and%20Electrical%20Properties%20of%20Tin-Doped%20Cadmium%20Oxide%20Films%20Prepared%20by%20Electron%20Beam%20Technique&rft.jtitle=Japanese%20Journal%20of%20Applied%20Physics&rft.au=Ali,%20H.%20M.&rft.date=2009-04-01&rft.volume=48&rft.issue=4R&rft.spage=41101&rft.pages=41101-&rft.issn=0021-4922&rft.eissn=1347-4065&rft_id=info:doi/10.1143/JJAP.48.041101&rft_dat=%3Ccrossref%3E10_1143_JJAP_48_041101%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true