Photoresist Removal Using Atomic Hydrogen Generated by Hot-Wire Catalyzer and Effects on Si-Wafer Surface

Photoresist Removal Using Atomic Hydrogen Generated by Hot-Wire Catalyzer and Effects on Si-Wafer Surface

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Veröffentlicht in:Japanese Journal of Applied Physics 2009-02, Vol.48 (2R), p.26503
Hauptverfasser: Yamamoto, Masashi, Horibe, Hideo, Umemoto, Hironobu, Takao, Kazuhisa, Kusano, Eiji, Kase, Masataka, Tagawa, Seiichi
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container_title Japanese Journal of Applied Physics
container_volume 48
creator Yamamoto, Masashi
Horibe, Hideo
Umemoto, Hironobu
Takao, Kazuhisa
Kusano, Eiji
Kase, Masataka
Tagawa, Seiichi
description
doi_str_mv 10.1143/JJAP.48.026503
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title Photoresist Removal Using Atomic Hydrogen Generated by Hot-Wire Catalyzer and Effects on Si-Wafer Surface
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